1982
DOI: 10.1109/tmtt.1982.1131163
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P-I-N Diodes for Low-Frequency High-Power Switching Applications

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Cited by 21 publications
(2 citation statements)
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“…The significant dimensions used of the device structure are documented in Table 1. The channel doping is very low, which results in a configuration similar to a P-i-N diode [10]. The nominal back gate (VBG) and front gate (VFG) bias conditions used for calibration of the TCAD deck are -1.0V and 1.2V respectively.…”
Section: IImentioning
confidence: 99%
“…The significant dimensions used of the device structure are documented in Table 1. The channel doping is very low, which results in a configuration similar to a P-i-N diode [10]. The nominal back gate (VBG) and front gate (VFG) bias conditions used for calibration of the TCAD deck are -1.0V and 1.2V respectively.…”
Section: IImentioning
confidence: 99%
“…Nowadays, PIN diode [4], as well as GaAs FET (Gallium arsenide field effect transistor) [5], has been widely used in RF switch. In this paper, a switch module for GSM application is designed with PIN diode, which is much cheaper and more widely used than GaAs FET.…”
Section: Introductionmentioning
confidence: 99%