“…The system is composed of light source, DMD, optical system (Fourier lens, Fourier filter, reduction lens), software system, 3D mobile platform, etc. In the process of digital mask exposure, DMD has the advantages of large exposure area, high resolution, high production efficiency, and low cost [ 8 , 9 , 10 ], which is widely used in MEMS production [ 11 ], micro optical device processing [ 12 , 13 , 14 ], 3D micro-nano structure processing [ 15 , 16 , 17 ], pattern transfer of printed circuit board (PCB) [ 18 ], etc. The output beam from the light source is irradiated onto the DMD after passing through the reflector.…”