Parallel optical nanolithography using nanoscale bowtie aperture array

Abstract

We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.

Review on Micro- and Nanolithography Techniques and their Applications

“…On the other hand, electron beam lithography and focused ion beam lithography are employed to fabricate metallic nanostructures on desired positions with a high precision. LSPR-based nanostructures can be exploited in detecting DNA hybridization [150,151], monitoring an intramolecular distance (molecular ruler) [152], nanolithography [153] and heat assisted magnetic recording [154].…”

Broken-diabolo nanoantenna for co-enhancing and -confining optical electric and magnetic field

“…Due to their capability of dramatically localizing and enhancing electromagnetic field, optical nanoantennas (OAs) have attracted much attention for near-field applications in bio-sensing [2], spectroscopy [3], nanolithography [4,5], etc. Optical nanoantennas can be divided into two kinds by their enhancing objects: OAs for enhancing electric fields and magnetic fields.…”

Optical nanolithography with λ/15 resolution using bowtie aperture array

“…Among various types of nanofabrication methods, such as electron beam lithography, nanoimprint lithography [2], dip-pen lithography [3] and laser direct writing [4], near-field optical lithography using metallic nano-apertures or antennas is a promising technique due to its capacity of sub-diffraction resolution, cost effective, and possibility of parallel operation. In this type of lithography, sharp-ridged apertures in metal, such as bowtie, C-and H-shaped apertures and plasmonic lenses are important structures as the optical focusing element due to its capability of producing high confined light spots beyond the diffraction limit with enhanced intensity in the near-field region [5][6][7][8][9][10]. However, the transmitted light of the aperture is subjected to strong divergence.…”