Abstract:A parallelizable simulator of the chemical shrink process of nanolithography is developed to investigate the process dependence on material properties. The chemical shrink process model employed for the simulator includes the cross-linking reaction of the resolution enhancement of lithography assisted by chemical shrink (RELACS) material, the inhibitor deprotection reaction of the chemically amplified (CA) resist, and the photoacid diffusion and trapping in the CA resist and RELACS material. It is found that, … Show more
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