1994
DOI: 10.1007/bf02651260
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Passivation of GaSb by sulfur treatment

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Cited by 53 publications
(36 citation statements)
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“…5,6 The remarkable enhancement in the photoluminescence (PL) yield from S-or Se-treated GaAs indicates that the chalcogenide-terminated GaAs surface exhibits an improved electronic surface structure relative to the native oxidized surface. 7,8 In particular, Se-based treatments result in GaAs surfaces more chemically stable than those prepared by S-based aqueous treatments.…”
Section: Introductionmentioning
confidence: 99%
“…5,6 The remarkable enhancement in the photoluminescence (PL) yield from S-or Se-treated GaAs indicates that the chalcogenide-terminated GaAs surface exhibits an improved electronic surface structure relative to the native oxidized surface. 7,8 In particular, Se-based treatments result in GaAs surfaces more chemically stable than those prepared by S-based aqueous treatments.…”
Section: Introductionmentioning
confidence: 99%
“…34 When exposed to an oxygen-containing environment such as air, the GaSb surface will form a native oxide layer and free Sb. 35 Both the oxide layer and free Sb strongly diminish the device performance. While the free Sb can act as metallic low resistance shunt, the oxide layer creates additional interface states promoting generation-recombination centers, charge accumulation centers, or trap levels.…”
mentioning
confidence: 99%
“…[5][6][7] Previous studies of the sulfurbased passivation using a ͑NH 4 ͒ 2 S-water solution have shown improved Schottky characteristics with a Au-GaSb barrier of 0.52-0.57 eV being reported. 8,9 The use of an aqueous process however, with and without S passivation, leads to a variety of results in the formation of a Au-GaSb Schottky diode with a wide range of the barrier height values being reported, even exceeding the band-gap energy. 10 Further improvements in the reproducibility and stability of the Au-GaSb diodes require a thorough removal of surface oxides and elemental Sb which entails a nonaqueous environment.…”
mentioning
confidence: 99%