2018
DOI: 10.1021/acsanm.8b00447
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Passivation of Surface States of AlGaN Nanowires Using H3PO4 Treatment To Enhance the Performance of UV-LEDs and Photoanodes

Abstract: Surface states serve as additional charge-carrier-trapping centers and create an energy barrier at the semiconductor−electrolyte interface. This in turn may severely reduce the internal quantum efficiency of Al x Ga 1−x N nanowire ultraviolet light-emitting diodes (UV-LEDs) and solar-to-hydrogen energy conversion efficiency of photoelectrodes used in photoelectrochemical water splitting applications. These states also cause Fermi-level pinning and band bending, leading to Shockley−Read−Hall nonradiative recomb… Show more

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Cited by 11 publications
(3 citation statements)
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“…spectra scan of binding energy (BE) obtained for three regions on the device, at a pass energy of 200 eV. All regions of the device show the expected characteristic peaks of Ga 3d, Al 2p, N 1s, O 1s and C 1s [58], [92], [93].…”
Section: Xpsmentioning
confidence: 99%
“…spectra scan of binding energy (BE) obtained for three regions on the device, at a pass energy of 200 eV. All regions of the device show the expected characteristic peaks of Ga 3d, Al 2p, N 1s, O 1s and C 1s [58], [92], [93].…”
Section: Xpsmentioning
confidence: 99%
“…(KOH) solution and phosphoric acid (H 3 PO 4 ); and both chemicals have been found to be able to reduce the adverse effects of the surface defects/states in AlGaN nanowires. [208][209][210] Moreover, the electrically injected AlGaN nanowire DUV lasers discussed in Section 4 are random lasers, i.e., the cavity cannot be controlled precisely. For real-world applications, a controlled cavity is necessary.…”
Section: Conclusion and Prospectsmentioning
confidence: 99%
“…Sun et al studied that tetramethylammonium hydroxide (TMAH) wet treatment optimized the micro trench at the bottom corner of the mesa sidewall [20]. Mahitosh et al improved the internal quantum efficiency of the near-band-edge emission peak from 3% to 7% through phosphoric acid [21]. The other type of treatment is conducted by dielectric materials passivation, which includes but is not limited to SiO 2 , SiNx, and Al 2 O 3 [17].…”
Section: Introductionmentioning
confidence: 99%