Pattern defect reduction and LER improvement of chemo-epitaxy DSA process

Muramatsu, Makoto; Nishi, Takanori; You, Gen; Saito, Yûsuke; Ido, Yasuyuki; Oikawa, Noriaki; Tobana, Toshikatsu; Ito, Kiyohito; Morikita, Shinya; Kitano, Takahiro

doi:10.1117/12.2257952

Cited by 11 publications

(8 citation statements)

References 15 publications

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“…The organized alignment of BCPs can be induced by the use of different DSA techniques involving chemical patterns, neutral surfaces, top‐coats, topographical patterns, nano‐confinement, mechanical shearing forces, electric fields, and magnetic fields . These DSA processes of BCPs generate highly periodic nanostructures with a low defect level, and result in dense areal packing of nanopatterns with a feature size of sub‐10 nm …”

Section: Introductionmentioning

confidence: 99%

Sub‐5 nm Dendrimer Directed Self‐Assembly with Large‐Area Uniform Alignment by Graphoepitaxy

Park

Jung

Kwon

et al. 2019

Adv Funct Materials

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Directed self-assembly (DSA) using soft materials is an important method for producing periodic nanostructures because it is a simple, cost-effective process for fabricating high-resolution patterns. Most of the previously reported DSA methods exploit the self-assembly of block copolymers, which generates a wide range of nanostructures. In this study, cylinders obtained from supramolecular dendrimer films with a high resolution (<5 nm) exhibit planar ordering over a macroscopic area via guiding topographical templates with a high aspect ratio (>10) and high spatial resolution (≈20 nm) of guiding line patterns. Theoretical and experimental studies reveal that this property is related to geometrical anchoring on the meniscus region and physical surface anchoring on the sidewall. Furthermore, this DSA of dendrimer cylinders is demonstrated by the non-regular geometry of the patterned template. The macroscopic planar alignment of the dendrimer nanostructure reveals an extremely small feature size (≈4.7 nm) on the wafer scale (>16 cm 2 ). This study is expected to open avenues for the production of a large family of supramolecular dendrimers with different phases and feature dimensions oriented by the DSA approach.

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Section: Introductionmentioning

confidence: 99%

Sub‐5 nm Dendrimer Directed Self‐Assembly with Large‐Area Uniform Alignment by Graphoepitaxy

Park

Jung

Kwon

et al. 2019

Adv Funct Materials

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“…It has been suggested that optimization of pattern transfer process is one of the effective ways to improve the LER of DSA pattern. By using this method, LER can be improved less than 2 nm [75]. Further improvement is required for the sub-10-nm pattering node.…”

Section: Status and Challengesmentioning

confidence: 99%

Promising Lithography Techniques for Next-Generation Logic Devices

2018

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Continuous rapid shrinking of feature size made the authorities to seek alternative patterning methods as the conventional photolithography comes with its intrinsic resolution limit. In this regard, some promising techniques have been proposed as next-generation lithography (NGL) that has the potentials to achieve both high-volume production and very high resolution. This article reviews the promising NGL techniques and introduces the challenges and a perspective on future directions of the NGL techniques. Extreme ultraviolet lithography (EUVL) is considered as the main candidate for sub-10-nm manufacturing, and it could potentially meet the current requirements of the industry. Remarkable progress in EUVL has been made and the tools will be available for commercial operation soon. Maskless lithography techniques are used for patterning in R&D, mask/mold fabrication and low-volume chip design. Directed self-assembly has already been realized in laboratory and further effort will be needed to make it as NGL solution. Nanoimprint lithography has emerged attractively due to its simple process steps, high throughput, high resolution and low cost and become one of the commercial platforms for nanofabrication. However, a number of challenging issues are waiting ahead, and further technological progresses are required to make the techniques significant and reliable to meet the current demand. Finally, a comparative study is presented among these techniques.

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“…In contrast to top‐down fabrication methods, soft organic building blocks have the tendency to form arbitrarily oriented poly‐domain structures when left unguided, prohibiting their use in the fabrication of addressable media. To date, work has been published showing defect levels for pilot line processes (<100 cm 2 ), but defect levels are not yet low enough for manufacturing.…”

Section: Introductionmentioning

confidence: 99%

Directed Self‐Assembly of Liquid‐Crystalline Molecular Building Blocks for Sub‐5 nm Nanopatterning

Nickmans

Schenning

2017

Advanced Materials

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The thin‐film directed self‐assembly of molecular building blocks into oriented nanostructure arrays enables next‐generation lithography at the sub‐5 nm scale. Currently, the fabrication of inorganic arrays from molecular building blocks is restricted by the limited long‐range order and orientation of the materials, as well as suitable methodologies for creating lithographic templates at sub‐5 nm dimensions. In recent years, higher‐order liquid crystals have emerged as functional thin films for organic electronics, nanoporous membranes, and templated synthesis, which provide opportunities for their use as lithographic templates. By choosing examples from these fields, recent progress toward the design of molecular building blocks is highlighted, with an emphasis on liquid crystals, to access sub‐5 nm features, their directed self‐assembly into oriented thin films, and, importantly, the fabrication of inorganic arrays. Finally, future challenges regarding sub‐5 nm patterning with liquid crystals are discussed.

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Pattern defect reduction and LER improvement of chemo-epitaxy DSA process

Cited by 11 publications

References 15 publications

Sub‐5 nm Dendrimer Directed Self‐Assembly with Large‐Area Uniform Alignment by Graphoepitaxy

Sub‐5 nm Dendrimer Directed Self‐Assembly with Large‐Area Uniform Alignment by Graphoepitaxy

Promising Lithography Techniques for Next-Generation Logic Devices

Directed Self‐Assembly of Liquid‐Crystalline Molecular Building Blocks for Sub‐5 nm Nanopatterning

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