2007
DOI: 10.1557/proc-1059-kk10-03
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Pattern Formation During Nanowear of Gold Films

Abstract: The effects of water on the wear resistance of 3 µm thick sputtered gold films on silicon substrate using contact AFM and a scanning nanoindenter was investigated. In performing wear tests on gold samples in the presence of water, a significant increase in depth of the wear area was observed compared to the same tests performed in the ambient atmosphere (~55% humidity). These results were obtained using Hysitron Triboindenter on areas of 10x10 µm 2 and an Atomic Force Microscope on areas of 1x1 µm 2 . Nanowear… Show more

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Cited by 1 publication
(3 citation statements)
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“…At 3 Hz scanning frequency wear ripples started initiating during the first scan and propagated as the number of scans increased. Similar results were obtained on KBr and Al single crystals [6] in the ambient environment using the same system as well as using UHV-AFM on InSb semiconductor surface [5]. As the contact load increases beyond 6 µ N, material started moving to the scan edges and ripple structures were never initiated.…”
Section: Methodssupporting
confidence: 77%
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“…At 3 Hz scanning frequency wear ripples started initiating during the first scan and propagated as the number of scans increased. Similar results were obtained on KBr and Al single crystals [6] in the ambient environment using the same system as well as using UHV-AFM on InSb semiconductor surface [5]. As the contact load increases beyond 6 µ N, material started moving to the scan edges and ripple structures were never initiated.…”
Section: Methodssupporting
confidence: 77%
“…at the left side of the scan edge, which is attributed to the sample tilt. Similar behavior was seen in KBr in the ambient environment using Hysitron Triboindenter [6] and on the InSb semiconductor surface in the UHV-AFM [5]. A possible mechanism for the initiation of ripples is due to piezo hysteresis and surface slope.…”
Section: Methodssupporting
confidence: 58%
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