“…PbTe films are prepared by various methods, such as electrochemical deposition, laser pulse deposition, molecular beam epitaxy, magnetron sputtering, hot wall epitaxy [31][32][33], vacuum evaporation [34], etc. Among them, the magnetron sputtering method is widely used because of its advantages, such as its high preparation rate, low growth temperature, low production cost, and large film forming area [35].…”