2000
DOI: 10.1016/s0039-6028(00)00256-9
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Pattern formation in PbTe multilayer films

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Cited by 11 publications
(2 citation statements)
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“…PbTe films are prepared by various methods, such as electrochemical deposition, laser pulse deposition, molecular beam epitaxy, magnetron sputtering, hot wall epitaxy [31][32][33], vacuum evaporation [34], etc. Among them, the magnetron sputtering method is widely used because of its advantages, such as its high preparation rate, low growth temperature, low production cost, and large film forming area [35].…”
Section: Preparation Of Thin Filmsmentioning
confidence: 99%
“…PbTe films are prepared by various methods, such as electrochemical deposition, laser pulse deposition, molecular beam epitaxy, magnetron sputtering, hot wall epitaxy [31][32][33], vacuum evaporation [34], etc. Among them, the magnetron sputtering method is widely used because of its advantages, such as its high preparation rate, low growth temperature, low production cost, and large film forming area [35].…”
Section: Preparation Of Thin Filmsmentioning
confidence: 99%
“…Recently, other specific low-dimensional structures such as multiple quantum-well systems, super lattices, and quantum dots have attracted much attention in various fields such as infrared sensor arrays, vertical cavity surface emitting laser, thermoelectricity, self-organized semiconductor nanostructures, and persistent low-temperature photoconductivity [9]. Various methods have been utilized to prepare PbTe thin films such as thermal evaporation [10], RF magnetron sputtering [11], pulsed laser evaporation [12], electrodeposition [13], and hot-wall epitaxy [14]. However, not much work has been reported on flash evaporated PbTe thin films.…”
Section: Introductionmentioning
confidence: 99%