2008
DOI: 10.1080/10601320802380190
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Patterning Flexible Substrates Using Surface Relief Structures in Azobenzene Functionalized Polymer Films

Abstract: A novel method for maskless micro-patterning of polymeric substrates is presented. First, an azobenzene functionalized polymer film is spin-coated on a Poly (ethylene terephthalate) (PET) sheet. Then surface relief structures are optically inscribed on the polymer film by interference of laser beams. The patterned azobenzene functionalized film is then etched in the plasma chamber such that the gratings are transferred to the PET substrate. Finally, any remaining azobenzene functionalized polymer is dissolved … Show more

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Cited by 2 publications
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“…Other procedures can be used to form nanostructures with SRG, with numerous examples being based on an etching step. For instance, Shevchenko and coworkers formed nanostructures in silicon through the reactive ion etching of a patterned azopolymer with the eventual use of an intermediate Al 2 O 3 photomask (Figure ). …”
Section: Motion From Photochromic Molecular Switchesmentioning
confidence: 99%
“…Other procedures can be used to form nanostructures with SRG, with numerous examples being based on an etching step. For instance, Shevchenko and coworkers formed nanostructures in silicon through the reactive ion etching of a patterned azopolymer with the eventual use of an intermediate Al 2 O 3 photomask (Figure ). …”
Section: Motion From Photochromic Molecular Switchesmentioning
confidence: 99%