2019
DOI: 10.1038/s41928-018-0191-0
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Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography

Abstract: Two-dimensional semiconductors, such as molybdenum disulfide (MoS2), exhibit a variety of properties that could be useful in the development of novel electronic devices. However, nanopatterning metal electrodes on such atomic layers, which is typically achieved using electron beam lithography, is currently problematic, leading to non-ohmic contacts and high Schottky barriers. Here, we show that thermal scanning probe lithography can be used to pattern metal electrodes with high reproducibility, sub-10 nm resol… Show more

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Cited by 133 publications
(119 citation statements)
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“…Effective implementation of many techniques, including directed assembly, nanoimprinting, and lithography combined with electron-beam etching, thermochemical, and scanning probe technologies, for fabricating structures with high spatial resolution has been demonstrated, but these techniques are time consuming, costly, or lack versatility [9][10][11][12][13] . In contrast, femtosecond laser-based processing, associated with the benefits of being facile, maskless, and efficient, is a qualified candidate for industrial development 14 , and recently, it has been applied in the micro/nanomanufacturing of graphene analogs, such as typical patterning of GO films 15 .…”
Section: Introductionmentioning
confidence: 99%
“…Effective implementation of many techniques, including directed assembly, nanoimprinting, and lithography combined with electron-beam etching, thermochemical, and scanning probe technologies, for fabricating structures with high spatial resolution has been demonstrated, but these techniques are time consuming, costly, or lack versatility [9][10][11][12][13] . In contrast, femtosecond laser-based processing, associated with the benefits of being facile, maskless, and efficient, is a qualified candidate for industrial development 14 , and recently, it has been applied in the micro/nanomanufacturing of graphene analogs, such as typical patterning of GO films 15 .…”
Section: Introductionmentioning
confidence: 99%
“…For writing the spin texture of the SAF, a highly localized field cooling is performed via tam‐SPL, by sweeping a heated scanning probe on the surface of the sample in an applied external field (see Experimental Section). This allows us to spatially control the exchange bias direction, and therefore the magnetization orientation of the top CoFeB layer, at remanence.…”
mentioning
confidence: 99%
“…Contact engineering between 2D materials and bulk materials (such as metallic electrodes) has been a key issue of 2D electronics [34,35]. Conventional techniques are problematic in terms of impurities (optical lithography and electron beam lithography), which give rise to a large contact resistance.…”
Section: Transfer Of 2d Materials With Pre-deposited Metal Filmsmentioning
confidence: 99%