Patterning of defect arrays with e-beam lithography used to develop a high throughput e-beam defect inspection tool

Cummings, K. D.; Bunday, B; Malloy, Matthew; Hartley, John G.; Banu, Laila; Mellish, Mac; Chao, Weilun; Bleier, A.; Banerjee, Amit

doi:10.1116/1.4934052

Cited by 6 publications

(2 citation statements)

References 15 publications

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“…These objects could include dust on optical components inside the microscope or on the sample. Moreover, from the pseudo-phase, we can clearly observe some bright and some dark spots due to nanoscale defects on the sample [32], most of which are overwhelmed in the intensity image. To make a quantitative comparison between the intensity and pseudo-phase images, we define a fractional contrast C where S peak is the peak value of a local area in the image and S mean is the mean value of the entire image.…”

Section: Optical System Assessment and Nanoscale Defect Inspectionmentioning

confidence: 95%

Regularized pseudo-phase imaging for inspecting and sensing nanoscale features

et al. 2019

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Recovering tiny nanoscale features using a general optical imaging system is challenging because of poor signal to noise ratio. Rayleigh scattering implies that the detectable signal of an object of size d illuminated by light of wavelength λ is proportional to d 6 /λ 4 , which may be several orders of magnitude weaker than that of additive and multiplicative perturbations in the background. In this article, we solve this fundamental issue by introducing the regularized pseudo-phase, an observation quantity for polychromatic visible light microscopy that seems to be more sensitive than conventional intensity images for characterizing nanoscale features. We achieve a significant improvement in signal to noise ratio without making any changes to the imaging hardware. In addition, this framework not only retains the advantages of conventional denoising techniques, but also endows this new measurand (i.e., the pseudo-phase) with an explicit physical meaning analogous to optical phase. Experiments on a NIST reference material 8820 sample demonstrate that we can measure nanoscale defects, minute amounts of tilt in patterned samples, and severely noisepolluted nanostructure profiles with the pseudo-phase framework even when using a low-cost bright-field microscope.

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Section: Optical System Assessment and Nanoscale Defect Inspectionmentioning

confidence: 95%

Regularized pseudo-phase imaging for inspecting and sensing nanoscale features

et al. 2019

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“…today's electronics industry. As an example, CNF was key to producing an intentional defect array (with programmed defects down to 5 nm in size) that was to be used for proving in new wafer inspection systems [21].…”

Section: The Expansion Into Interdisciplinary Researchmentioning

confidence: 99%

The evolution of the Cornell NanoScale Facility and synergies with the semiconductor Industry

Tennant¹

2019

Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019

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University fabrication facilities that are both open and shared were created to enable far wider access to tools and methods previously only available to faculty at a few select universities. The lab now known as the Cornell NanoScale Science and Technology Facility (CNF), was the first NSF-supported national user facility in this field about 42 years ago. This talk will consider how open and shared facilities have evolved, and how important it has been to both academic and industrial research in the US. Flexibility and measured changes make CNF and its partners in the National Nanotechnology Coordinated Infrastructure (NNCI) even more relevant going forward as we see technical challenges that must be met due to the explosion in interdisciplinary fields. Some of the needs we see for the future, surprisingly, will have many synergies with the semiconductor industry.

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