Patterning of poly(3‐octylthiophene) conducting polymer films by electron beam exposure

Abstract

Communications [l 11 We thank Dr. Jonas, Bayer AG, Uerdingen for this measurement. [12] The data of a yellow and a black crystal (data in square brackets) of the compound with the dimensions ca. 0.55 x 0.22 x 0.17 [0.55 x 0.22 x 0.17]A3 were recorded with a Nicolet R3 mjV four circle diffractometer (MoKu-radiation, graphite-monochromator) at 130 K

Single Conducting‐Polymer Nanowires

“…It was found that when a spin-cast poly(3-octylthiophene) (P3OT) film was selectively exposed to a 50 KeV e-beam with dosages up to 800 nC cm À2 , the polymer became insoluble in chlorobenzene, while the unexposed portion was still soluble [1]. The authors suggested that the e-beam irradiation causes the polymer chains to partially cross-link and consequently reduces the solubility of the polymer in chlorobenzene.…”

“…Similarly, microscale features have also been made with optical irradiation (Refs. 11 and 12 in [1]). …”

Patterning π-Conjugated Polymers

“…[38] Direct patterning of P3ATs can also be achieved by exposure to an electron beam. [39] In this way, 50 nm wide lines have been obtained through which a Coulombic blockade of tunneling current has been observed.…”

Patterning ability of conducting polypyrrole thin films by positive photoresist

“…Reactive patterning techniques include photochemical patterning [1,[6][7][8], areaselected polymerization on electrodes modified with a patterned self-assembled monolayer SAM, by microcontact printing (lCP) method [7,[9][10][11][12][13][14], electro-deposition within channels between two electrodes [1,[15][16][17][18], microlithography by Scanning Electro-Chemical Microscope (SECM) [1,7,19,20], electrochemical dip-pen nanolithography (E-DPN) [1,21,22], template assisted synthesis [1,5], soft lithography assisted synthesis [23][24][25][26]. While non-reactive patterning techniques include but not limited to electronbeam writing [27] laser writing [28,29] screen printing [7,30], ink-jet printing [7,31,32], soft lithography [7,33] and nanoimprint lithography [34][35][36].…”