Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires

Gao, Fan; Zhang, Dakuan; Wang, Yunlong; Sheng, Yinghong; Yan, Shancheng; Wang, Xinran; Chen, Kunji; Shen, Jialin; Pan, Lijia; Zhou, Mi; Shi, Yi

doi:10.1063/1.4907042

Cited by 5 publications

(5 citation statements)

References 29 publications

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“…Beside the presence of a misalignment, chaining of more than one nanowires inside the electric [28] or magnetic field [32] was observed, in particular when a high concentration of nanowire solution was used. The last type of alignment techniques employs surface forces via chemical [31, 33–36], topological surface patterns [37], and shear force induced by surface [38, 39], to assemble nanowires within specific locations of the substrate. These techniques overall show a low ratio of aligned nanowires when they are not combined with other techniques [34, 40].…”

Section: Introductionmentioning

confidence: 99%

Patterned electromagnetic alignment of magnetic nanowires

Beheshti

Choi

Geng

et al. 2018

Microelectronic Engineering

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A combination of electromagnetic alignment and topological pattern assisted alignment to position magnetic nanowires, which is referred to as the Patterned Electromagnetic Alignment (PEA), is developed and examined. Electrodeposited, FeNiCo nanowires with different lengths were used as the test nanomaterial, and the microscale grooved surface was formed by UV nanoimprint lithography. The accuracy of the PEA with FeNiCo nanowires was evaluated by measuring the deviation angle from the direction of the magnetic field line for different magnetic field strengths and nanowire lengths, and a statistical alignment distribution was reported for different nanowire length groups. The results were compared with those of the electromagnetic alignment on flat surfaces and in grooved-patterned substrates without electromagnetic alignment. Overall, the deviation angle for the PEA was lower than that for the electromagnetic alignment when all other experimental conditions were identical, indicating that the alignment accuracy along the direction of the magnetic field lines was enhanced in the presence of surface micro grooves. This can be attributed to the fact that, upon attachment of nanowires to the substrate surface, the surface micro grooves in the PEA add additional deterministic characteristics to the otherwise stochastic nature of the nanowire deposition and solvent evaporation processes compared to the sole electromagnetic alignment.

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Section: Introductionmentioning

confidence: 99%

Patterned electromagnetic alignment of magnetic nanowires

Beheshti

Choi

Geng

et al. 2018

Microelectronic Engineering

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“…Frequently, measurement of alignment of individual nanostructures has been done by hand through measuring the angle of alignment θ i of individual 1D nanostructures [24][25][26] using scanning electron microscopy (SEM) images such as in Figure 1. Not only is this approach tedious and time consuming, but it is also inaccurate and nearly impossible to execute without bias.…”

Section: Introductionmentioning

confidence: 99%

Automated quantification of one-dimensional nanostructure alignment on surfaces

Dong¹,

Goldthorpe²,

Abukhdeir³

2016

Nanotechnology

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A method for automated quantification of the alignment of one-dimensional (1D) nanostructures from microscopy imaging is presented. Nanostructure alignment metrics are formulated and shown to be able to rigorously quantify the orientational order of nanostructures within a two-dimensional domain (surface). A complementary image processing method is also presented which enables robust processing of microscopy images where overlapping nanostructures might be present. Scanning electron microscopy (SEM) images of nanowire-covered surfaces are analyzed using the presented methods and it is shown that past single parameter alignment metrics are insufficient for highly aligned domains. Through the use of multiple parameter alignment metrics, automated quantitative analysis of SEM images is shown to be possible and the alignment characteristics of different samples are able to be quantitatively compared using a similarity metric. The results of this work provide researchers in nanoscience and nanotechnology with a rigorous method for the determination of structure/property relationships, where alignment of 1D nanostructures is significant.

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“…Graphene nanoribbon and nanomesh patterns are fabricated in large scale by choosing different PSMs. This method has been successfully applied to pattern another kind of thin film-self assembled monolayers (SAMs) in our previous work [21] and it is proven equally effective for graphene and other 2D materials.…”

Section: Introductionmentioning

confidence: 99%

Phase shifting mask modulated laser patterning on graphene

Gao

Liu

et al. 2016

Nanotechnology

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A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.

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Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires

Cited by 5 publications

References 29 publications

Patterned electromagnetic alignment of magnetic nanowires

Patterned electromagnetic alignment of magnetic nanowires

Automated quantification of one-dimensional nanostructure alignment on surfaces

Phase shifting mask modulated laser patterning on graphene

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