PECVD of Low Carbon Content Silicon Nitride-Like Thin Films with Dimethylaminosilanes

Mundo, Rosa Di; Ricci, M.; d’Agostino, Riccardo; Fracassi, Francesco; Palumbo, Fabio

doi:10.1002/ppap.200730203

Cited by 22 publications

(15 citation statements)

References 21 publications

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“…Other DMASs without SiH bonds such as dimethylamino‐trimethylsilane (DMATMS, Me 3 SiNMe 2 ) and tris(dimethylamino)methylsilane (TDMAMS, MeSi(NMe 2 ) 3 ) have been tested under the same experimental conditions. Coatings with similar characteristics have been obtained with all the DMASs as well as indications of a different involvement of the NMe 2 and SiMe groups in the film formation 20. DMASs without SiH functionalities have been chosen since they are safer and less corrosive.…”

Section: Introductionmentioning

confidence: 84%

Methylaminosilane fed Inductively Coupled Plasmas for Silicon Nitride Deposition

Mundo

Palumbo

Fracassi

et al. 2008

Plasma Processes & Polymers

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Silicon nitride‐like films can be deposited by inductively coupled discharges fed with dimethylaminosilanes without addition of reactive gases. At high input power fairly inorganic films can be obtained. In the present work in situ diagnostics of plasma phase, i.e. Fourier transform infrared spectroscopy (FT‐IRAS) and optical emission spectroscopy (OES), have been utilized to investigate the deposition mechanism of bis(dimethylamino)dimethylsilane (BDMADMS) fed discharges. Results indicate that the monomer undergoes a pronounced depletion even at low input power and that fragmentation increases with increasing this parameter. The main fragmentation steps seem to involve the cleavage of the SiN bond and the conversion of the –NMe2 group.

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Section: Introductionmentioning

confidence: 84%

Methylaminosilane fed Inductively Coupled Plasmas for Silicon Nitride Deposition

Mundo

Palumbo

Fracassi

et al. 2008

Plasma Processes & Polymers

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“…PECVD deposition of APTES is expected to result in reproducible silanized surfaces containing reactive amine groups, with good adhesion to cycloolefin polymer through a siloxane network. The characteristics of PECVD coatings are highly dependent on the nature of the substrate, the precursor and the plasma characteristics including input power and deposition time (Di Mundo 2007).…”

Section: Introductionmentioning

confidence: 99%

Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials

Volcke

Gandhiraman

Gubala

et al. 2010

Biosensors and Bioelectronics

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Functionalization of the plastic chips for selective immobilization of biomolecules is one of the key challenges to be addressed in commercialization of the next-generation point-of-care (POC) diagnostics devices. Multistep liquid-phase deposition process requires a large quantity of solvent to be used in anhydrous conditions, providing quantity of industrial liquid waste. We, in this work, have demonstrated a solventless plasma-based process that integrates low-cost, high throughput, high reproducibility and ecofriendly process for the functionalization of POC device platforms. Amine functionalities have been deposited by plasma-enhanced chemical vapour deposition 2 (PECVD) using a new precursor. For a successful and efficient plasma functionalization process, an understanding of the influence of plasma process parameters on the surface characteristics is essential. The influence of the plasma RF power and the deposition time on the deposited amount of amino functionalities and on their capacity to immobilize nano-objects (i.e., nanoparticles) and biomolecules (i.e. DNA) was examined. Surfacial properties were related to the binding capacity of the films and to the amino content, as revealed by the Ònanoparticle approachÓ and DNA attachment experiments. The key process determinants were to have a sufficient power in the plasma to activate and partially fragment the monomer but not too much as to lose the reactive amine functionality, and sufficient deposition time to develop a reactive layer but not to consume or erode the amine reactivity. An immunoassay performed using human immunoglobulin (IgG) as a model analyte shows an improvement of the detection limit by two orders of magnitude beyond that obtained using devices activated by liquid-phase reaction.

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“…Indeed, it was shown that the use of NH 3 / TMS mixture can increase significantly the nitrogen content [18] and an incorporation of 28 at.% of nitrogen was observed. Moreover, other recent studies [19,20] have shown that the use of dimethylaminosilane monomers tested as SiN x precursors such as dimethylaminotrimethylsilane (DMATMS), bis (dimethylamino)dimethylsilane (BDMADMS) and tris(dimethylamino)methylsilane (TDMAMS) allows to obtain nitrogen contents of 10 to 30 at.%, depending on the experimental parameters.…”

Section: Chemical Compositionmentioning

confidence: 99%

High deposition rates of uniform films in tetramethylsilane-based plasmas generated by elementary microwave sources in matrix configuration

Latrasse

Lacoste

Sánchez-López

et al. 2009

Surface and Coatings Technology

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PECVD of Low Carbon Content Silicon Nitride-Like Thin Films with Dimethylaminosilanes

Cited by 22 publications

References 21 publications

Methylaminosilane fed Inductively Coupled Plasmas for Silicon Nitride Deposition

Methylaminosilane fed Inductively Coupled Plasmas for Silicon Nitride Deposition

Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials

High deposition rates of uniform films in tetramethylsilane-based plasmas generated by elementary microwave sources in matrix configuration

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