“…Presently, overall power is dramatically increasing with scaling of technology in DSM region. 16 Moreover, Table 3 exhibits that, in comparison to a temperature-independent model of MLGNR resistance, 16 the average relative improvement in delay and power dissipation achieved is approximately 37.24% and 19.59%, respectively, using temperature-dependent model with interconnect lengths varying from 200 to 1000 μm. 16,21,36,37 A power dissipation ratio (MLGNR/Cu) for long (~1 mm) interconnect with rise in temperature, ranging from 300 K to 500 K, is illustrated in Figure 8 at 22 nm technology node.…”