Performance assessment of run-to-run control in semiconductor manufacturing based on IMC framework

Adaptive EWMA controller based on dynamic modeling in semiconductor manufacturing

“…Our previous study [2] shows that parameters of the noise disturbance, δ and θ , can be identified using previous input and output. Meanwhile, the disturbance can be predicted through EWMA controllers by (7).…”

“…Nowadays, it is confronted with more and more huge challenges to ensure defect-free products due to an enlarging wafer diameter (300mm or bigger) and a shrinking feature size (0.45um or smaller) [1], [2]. In view of this phenomenon, run-to-run control, an advanced process control method that combines the advantages of statistical process control (SPC) and engineering process control (EPC) is proposed [3], [4].…”

Integrated Product and Process Control for Sustainable Semiconductor Manufacturing

“…Supposing there is only one single product fabricated in the process, it is proved that EWMA control can achieve satisfactory performance as long as the drift term is not too big [15,16]. However, in a mixed-product environment where multiple products are fabricated by the same process and equipment, the disturbance dynamics ( , ) differ from products, and the product performance could be largely degraded.…”

“…(4) and the MSE value should be minimized to achieve a better product quality. For a EWMA RtR controller, it is proved [15] that the overall control performance can be evaluated as below.…”

“…The IPPC scheme can compensate the influence of disturbance and maximize the OPP index. For loop 2, unless change the EWMA controller into a double EWMA controller, the variance cannot be further reduced [15,18].…”