Abstract:The deep sub-micron (DSM) process nodes are increasingly marred by layout-dependent effects. The principal reason preventing layout synthesis during circuit design is the cost of edition, verification and extraction of the intermediate solutions repeatedly. This paper proposes a circuit and layout co-optimization scheme through a novel parasitic model-building scheme that exchanges information between the two flows. A placement-based parasitic estimation method to provide parasitic estimations to schematic opt… Show more
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