Recently, plasma deposition at atmospheric pressure has become a promising technology due to its reduced equipment costs and its possibility of in‐line processing. The main aim of this work was to show a process for the deposition of functional layers on hollow objects surface by plasma discharge generated above the liquid electrolyte. In principle, this process is based on the surface dielectric barrier discharge, where the plasma is generated from the boundary line of liquid precursor and dielectric surface. As a model precursor compound a hexamethyldisiloxane was chosen for deposition on external and internal wall surface of polytetrafluoroethylene tube.