Transparent semiconductors play an important role in the modern electronics industry, as advanced devices such as optical windows, photovoltaic cells, and flat panel displays require such components. [1][2][3] However, because of their poor photoelectric properties, p-type transparent conductive materials (TCMs) are not used widely in the modern electronics industry, which has limited the development of devices such as touch-sensitive transparent thin-film transistors. [4][5][6][7] Hence, novel transparent p-type semiconductors with good photoelectric performance are required, for the continued development of advanced devices.Potential p-type TCMs applicable to semiconductors have been studied since 1997, when Hosono et al. proposed "chemical modulation of the valence band" (CMVB). p-type CuAlO 2 with a delafossite structure was obtained with this technique, [8][9][10] subsequently enabling the discovery and study of the CuMO 2 (M ¼ B, Al, Cr, etc.) family of materials. [11][12][13][14][15][16] However, delafossite materials either have low carrier mobilities or low carrier concentrations because of their high-valence band maximum (VBM) tail states. Thus, to improve their photoelectric properties, chalcogens have been used as a partial replacement for oxygen in the delafossite structure, because of their easier hybridization with Cu's 3d orbital electrons. [17,18] LaCuOS, the first p-type oxychalcogenide material, was developed based on this principle, and more LnCuOCh materials (Ln ¼ La, Nd, Ce, etc. and Ch ¼ S, Se, and Te) have subsequently been studied. Generally, transparent p-type LnCuOCh semiconductors are prepared using magnetron sputtering, pulsed laser deposition, or solid-state reaction techniques. [19][20][21][22][23] However, as well as being costly and difficult