“…Polymer brushes Poly( N -isopropylacrylamide) (PNIPAM), PMMA, etc., [ 48 ] PS, PNIPAM and PNBA [ 51 c , 61 ] nanoshaving, nanoscratching physical: mechanical scratching of the surface layer [ 48 ] or brush fi lm [ 51c , 61 ] 100 nm 1D cantilever array photopolymerization of coumarinderivative thiols [ 56 ] [ 49 ] polymer brushes by ROMP, [ 55 ] PAA, PNIPAM, POEGMA etc., [ 62 ] PAA [ 63 ] AFM electrochemical oxidation chemical: electrochemical oxidation of the substrate, [ 49 , 55 ] brush fi lm [ 62 ] or initiators [ 63 ] 40 nm, [ 49 , 62 ] ≈ 200 nm [ 63 ] single tip the many examples, DPN and its derivatives are the most frequently reported tools for parallel patterning. The parallelization route has rendered SPL as potentially competitive with other serial nanolithographic tools, such as industrial EBL.…”