A large
crossbar array is desirable for high-density 3D stacking
phase change memory (PCM) applications, in which the leakage current
is mainly decided by selector devices. Meanwhile, a large driving
current is also needed to meet the Reset operation of the PCM cell.
Here, we propose a selector based on a nanoscale HfO2 film
via As ion implantation, which has a low threshold voltage of 1.9
V, a milliamp-scale high driving current, a large selectivity of 106, fast turn on speed, and good endurance (108 switching
cycles). These excellent performances make it applicable in the high-density
stacked PCM application.