Reduction of the film thickness of phase-change film and the adoption of GeN-or ZrO 2 -based dielectric films are both effective in achieving good thermal stability in phase-change optical disks. It was experimentally confirmed that, at a heating rate of 10 C/min, the crystallization temperature T x of the Ge 2 Sb 2 Te 5 amorphous film when sandwiched by ZnS-SiO 2 films markedly increases from 162 to 197 C, while the thickness of the Ge 2 Sb 2 Te 5 film decreases from 10 to 3 nm. T x also slightly increases when ZnS-SiO 2 films are substituted for GeN-based films (from 162 to 165 C) and ZrO 2 -based films (from 162 to 167 C). At the same time, the activation energy of crystallization is 2.4 eV for both GeN-and ZrO 2 -based films, and is higher than 2.2 eV for ZnS-SiO 2 films.