The use of electrochemistry, X-ray photoelectron spectroscopy, and resonant X-ray spectroscopy has unlocked the paradox of interfacial hole conduction through amorphous TiO 2 (a-TiO 2 ) to deposited Ni, Ir, and Au metal catalysts. Although electrocatalysts for the oxygen-evolution reaction derived from metallic Ir and Ni have mutually similar overpotentials in alkaline media, Si/a-TiO 2 /Ir interfaces exhibit higher overpotentials than Si/a-TiO 2 /Ni interfaces. The data allow formulation of full band energy diagrams for n-Si/a-TiO 2 /metal interfaces for M = Ni, Ir, or Au. Although both Ni and Ir produce band bending in a-TiO 2 favoring hole conduction, only Ni creates multiple states within the a-TiO 2 band gap at the a-TiO 2 /Ni interface, which produces a quasi-metallic interface at the a-TiO 2 /Ni junction. Au, however, produces a flat-band interface that limits hole conduction without any new band gap states.