Double-Ronchi shearing
interferometry is a promising
technique for in situ wavefront aberration measurement of the projection lens
in photolithography systems. In practice, the non-uniformity of
illumination is an important issue affecting the interference field,
which has not been systematically researched. In this work, the
interference field errors caused by non-uniform illumination
distributions are analyzed utilizing the theories of scalar
diffraction. The theoretical analysis has been verified by simulation
and fundamental experiments. Results show that the uniformity
requirements for the abrupt annular, Gaussian, and uniform random
illumination distribution (RD) are 0.9434, 0.8439, and 0.2751,
respectively, with a shear ratio of 5% and a relative wavefront
reconstruction error of 1%. The uniformity of the three distributions
is reduced to 0.6513, 0.5864, and 0.1234, respectively, with the shear
ratio shrunk to 3%. When the shear ratio is less than 1%, there is no
specific requirement for illumination uniformity.