Phase synthesis of a holographic metrological diffraction grating of unlimited length

Turukhano, B.G.; Gorelik, V.P.; Kovalenko, S.; Turukhano, N.

doi:10.1016/0030-3992(95)00098-4

Cited by 14 publications

(5 citation statements)

References 3 publications

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“…The complexity and cost of this equipment will also become limiting factors. Another method is stitching, which is mainly divided into exposure stitching by synthesis of multiple holographic phase sub-apertures represented by the Leningrad Nuclear Physics Institute (LNPI) [ 20 ] and mechanical stitching (multiple small gratings are stitched into large gratings) proposed by the University of Rochester [ 21 ] . For this technique, the stitching errors caused by control accuracy need to be significantly strictly limited, otherwise the far-field focus may deteriorate.…”

Section: Introductionmentioning

confidence: 99%

Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication

Hu,

Wan,

Jiang

et al. 2023

High Pow Laser Sci Eng

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The large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultrashort-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to largescale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers.

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Section: Introductionmentioning

confidence: 99%

Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication

Hu,

Wan,

Jiang

et al. 2023

High Pow Laser Sci Eng

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“…In 1996 Turukhano et al . proposed a phase synthesis technique to make long grating scales 6 . They utilized narrow auxiliary gratings placed alongside the substrate for phase adjustment and did not consider attitude adjustment.…”

Section: Introductionmentioning

confidence: 99%

Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment

Zhao

Zeng

2017

Sci Rep

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Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the aperture of the collimating lenses. Here we propose broad-beam scanning exposure which employs the latent grating generated continuously during scanning for real-time dynamic fringe locking and thus achieves unlimited recording length. This method is experimentally proved to make high-quality gratings, and is expected to be a new type of interference lithography.

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“…The above difficulty faced by the single-exposure approach can be avoided by a multipleexposure approach, which includes the scanning beam interference lithography (SBIL) technique [1] first developed at MIT and the phase synthesis technique proposed by Turukhano et al [2]. The former has successfully produced gratings of size 910×420 mm 2 , which is the largest size to date.…”

Section: Introductionmentioning

confidence: 99%

“…In an earlier work of our group [3] we made an optical mosaic grating by consecutive, phaseinterlocked, holographic exposures using diffraction from the latent grating rather than from the reference gratings as in [2]. (Holographic exposure of a photoresist film creates a weak volume grating whose diffraction efficiency is very weak, typically of the order of 10 −6 , but detectable; hence the term latent grating).…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Zeng

Shi

2010

KEM

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Contemporary chirped-pulse-amplified high-power laser systems rely on meter-sized diffraction gratings for pulse compression. Fabricating large gratings is a bottle-neck problem. We developed a multiple-holographic-exposure method to fabricate large monolithic gratings. In consecutive exposures, the attitude of the photoresist-coated substrate is monitored and adjusted by using two interferometers with a He-Ne laser, and the relative position between the substrate and the exposure interference fringes is adjusted by using the interference fringes between the diffraction orders of the latent grating with the exposure beams as the incident beams. A mosaic grating with a size of 80×50 mm2 was fabricated, and the wavefront aberration of the 1st-order diffraction wavefront in the mosaic area is better than /10 PV @633 nm.

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Phase synthesis of a holographic metrological diffraction grating of unlimited length

Cited by 14 publications

References 3 publications

Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication

Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication

Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

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