“…Due to low cost and the ubiquity of Si in electronics, platinized silicon (SiPt, Pt/TiO2/SiO2/Si) is by far the most used substrate in ferroelectric oxide thin film CSD synthesis 17 . KNN thin film synthesis is no exception, and the majority of studies of KNN thin films are based on using SiPt substrates [19][20][21][22][23][24][28][29][30][31][32][33][34][35][36][40][41][42][43][46][47][48]52,53 , while a few other studies are reported using other substrates like SiO2/Si 38,58,59 , ZrO2/Si 44,45 , LaNiO3/Si 57 , Pt/MgO 39 , Pt/Al2O3 49,58 , metals 50,51,54 and SrTiO3 (STO) 18,[25][26][27]37,55,56 .…”