Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography

Brigo, Laura; Auzelyté, Vaida; Lister, Kevin; Brugger, Jürgen; Brusatin, Giovanna

doi:10.1088/0957-4484/23/32/325302

Cited by 24 publications

(14 citation statements)

References 21 publications

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“…It can be employed, for example, to evaluate radial distribution of the fictive temperature in pure silica optical fibers [55], porous silica supports for individual living cells [56] and phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography where the technique helped to propose a description of the tone switching mechanisms [57].…”

Section: Applications Of Molecular Spectroscopy To Current Research Imentioning

confidence: 99%

Fourier Transform Infrared and Raman Characterization of Silica-Based Materials

Capeletti¹,

Zimnoch²

2016

Applications of Molecular Spectroscopy to Current Research in the Chemical and Biological Sciences

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Fourier Transform Infrared and Raman are powerful techniques to evaluate silica and hybrid silica structure. It is possible to evaluate the silica network formation along the hydrolysis and condensation reactions in terms of siloxane rings formation and Si-O(-Si) angle deformation due to the introduction of organic groups, the employed synthetic route or encapsulated species interaction. The siloxane four-or six-membered rings imply in a more rigid or flexible network, respectively, in order to accommodate the organic groups. A structural analysis of the materials is of high importance, since interactions between the encapsulated molecules and the matrix are critical for the device performance, such as sensors. This type of device needs the permeation of an analyte to activate the encapsulated receptor molecules inside the silica structure. Fourier transform infrared spectrometry can be also used to determine parameters of the silica network as a function of the hydrophilicity/hydrophobicity degree and the siloxane ring structure with respect to thin film porosity. This silica structural analysis is reviewed along the text in a tentative of better exploring the data resulting from these powerful techniques. In addition, the functionalization of silica structures by the use of organoalkoxysilanes, which is important to the creation of high-specific materials, can be well described by these two complementary techniques. The Si-C bonds and the maintenance of the organic substituents such as methyl, octyl, octadecyl, vinyl, phenyl, aminopropyl, mercaptopropyl, isocyanatopropyl, iodopropyl, chloropropyl and glicydoxypropyl could be evaluated after the sol-gel synthesis process. The literature regarding silica vibrational spectroscopy is also explored creating a data bank of wave numbers for the most important bonds for different types of silica and hybrid silica materials obtained by different synthetic routes.

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Section: Applications Of Molecular Spectroscopy To Current Research Imentioning

confidence: 99%

Fourier Transform Infrared and Raman Characterization of Silica-Based Materials

Capeletti¹,

Zimnoch²

2016

Applications of Molecular Spectroscopy to Current Research in the Chemical and Biological Sciences

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“…Different light sources may differ in the penetration depth of the beam, the exposure time requirements, the achieved aspect ratio, resolution, and focusing power (Levy and Zayat, 2015). Electron beam nanolithography patterning features have been reported down to sub-10 nm with an aspect ratio of 4 ( Figure 2A) (Della Giustina et al, 2009;Brigo et al, 2012). Proximity X-ray lithography has been performed on hybrid films using a synchrotron source, achieving a resolution below 200 nm ( Figure 2B) (Della Giustina et al, 2007).…”

Section: Patterning With High Energy Radiationmentioning

confidence: 99%

Sol-Gel Thin Film Processing for Integrated Waveguide Sensors

Alberti

Jágerská

2021

Front. Mater.

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Integrated opto-chemical sensors present great advantages in comparison to the current lab equipment. They bring portability, reduced costs, facilitate in-situ measurements, as well as largely reduced sample volumes. In this quest, standard processing protocols over established materials, such as silicon nitride, silicon, silicon dioxide, titanium oxide, and even a wide variety of polymers have so far been the key toward on-chip devices. However, if very specific materials in terms of composition and tailored properties are required, the deposition via a solution represents a viable alternative. In this review, we highlight the role of sol-gel chemistry and top-down processing of sol-gel thin film layers in the design of waveguide-based optical sensors. In particular, we stress the advantages of porous sol-gel based materials as a new approach to increase sensitivity and selectivity, first when used as claddings, and, more recently, as waveguides with enhanced light–analyte interaction. We finally discuss the future perspectives of such devices to increase specificity in complex matrices, which is of utmost importance for bio-sensing.

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“…The bridged phenyl configuration resulted in a lower sensitivity to exposure: therefore, a higher dose would be required for patterning (also confirmed by independent exposures performed by electron beam lithography). 16 On the other hand, a lower sensitivity brings the benefit of higher stability and longer shelf life of the material which, after synthesis, is less prone to agglomeration. Besides, the finding that a considerable amount of doubly bonded carbon was still preserved or even newly formed after exposure is highly relevant for lithographic purposes.…”

Section: Energy [Ev]mentioning

confidence: 99%

Changes in the near edge x-ray absorption fine structure of hybrid organic–inorganic resists upon exposure

Fallica

Watts²,

Rösner³

et al. 2018

Nanotechnology

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We report on the near edge x-ray absorption fine structure (NEXAFS) spectroscopy of hybrid organic-inorganic resists. These materials are nonchemically amplified systems based on Si, Zr, and Ti oxides, synthesized from organically modified precursors and transition metal alkoxides by a sol-gel route and designed for ultraviolet, extreme ultraviolet (EUV) and electron beam lithography. The experiments were conducted using a scanning transmission x-ray microscope (STXM) which combines high spatial-resolution microscopy and NEXAFS spectroscopy. The absorption spectra were collected in the proximity of the carbon edge (∼290 eV) before and after in situ exposure, enabling the measurement of a significant photo-induced degradation of the organic group (phenyl or methyl methacrylate, respectively), the degree of which depends on the configuration of the ligand. Photo-induced degradation was more efficient in the resist synthesized with pendant phenyl substituents than it was in the case of systems based on bridging phenyl groups. The degradation of the methyl methacrylate group was relatively efficient, with about half of the initial ligands dissociated upon exposure. Our data reveal that such dissociation can produce different outcomes, depending on the structural configuration. While all the organic groups were expected to detach and desorb from the resist in their entirety, a sizeable amount of them remained and formed undesired byproducts such as alkene chains. In the framework of the materials synthesis and engineering through specific building blocks, these results provide a deeper insight into the photochemistry of resists, in particular for EUV lithography.

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Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography

Cited by 24 publications

References 21 publications

Fourier Transform Infrared and Raman Characterization of Silica-Based Materials

Fourier Transform Infrared and Raman Characterization of Silica-Based Materials

Sol-Gel Thin Film Processing for Integrated Waveguide Sensors

Changes in the near edge x-ray absorption fine structure of hybrid organic–inorganic resists upon exposure

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