Phosphorus-mediated growth of Ge quantum dots on Si(001)

Qin, Jie; Xue, Fei; Wang, Y.; Bai, Lihui; Cui, Jian; Yang, Xin; Fan, Yong

doi:10.1016/j.jcrysgro.2004.12.106

Cited by 6 publications

(2 citation statements)

References 19 publications

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“…However, conventional self-assembling of Ge QDs on Si(001) leads to a bimodal distribution of island shapes and sizes [4,5]. The addition of impurity atoms has been demonstrated [6][7][8][9][10][11] to be a valid option for modifying the growth mode and to produce more homogeneous ensembles of islands.…”

Section: Introductionmentioning

confidence: 99%

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Influence of Si interdiffusion on carbon-induced growth of Ge quantum dots: a strategy for tuning island density

et al. 2006

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We have studied the epitaxial growth of self-assembled Ge quantum dots when a submonolayer of carbon is deposited on a Ge wetting layer (WL) prior to the growth of the dots. Using atomic-force microscopy combined with optical techniques like Raman and ellipsometry, we performed a systematic study of the role played by thermally activated Si interdiffusion on dot density, composition and morphology, by changing only the growth temperature T(WL) of the WL. Strikingly, we observe that higher dot densities and a narrower size distribution are achieved by increasing the deposition temperature T(WL), i.e. by enhancing Si interdiffusion from the substrate. We suggest a two-stage growth procedure for fine tuning of dot topography (density, shape and size) useful for possible optoelectronic applications.

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