2005
DOI: 10.1016/j.susc.2005.06.082
|View full text |Cite
|
Sign up to set email alerts
|

Studying the lateral composition in Ge quantum dots on Si(001) by conductive atomic force microscopy

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

2
27
0

Year Published

2006
2006
2017
2017

Publication Types

Select...
7
2

Relationship

0
9

Authors

Journals

citations
Cited by 25 publications
(29 citation statements)
references
References 14 publications
2
27
0
Order By: Relevance
“…2a – h , respectively. Before NHH etching, ring-shaped and cross-shaped current distributions are observed on dome and pyramid QDs, respectively, similar to the results reported in our previous papers [ 31 , 32 ]. For simplicity, only the dome-shaped QDs will be concerned afterwards, as the result is similar for pyramid-shaped QDs.…”
Section: Resultssupporting
confidence: 89%
“…2a – h , respectively. Before NHH etching, ring-shaped and cross-shaped current distributions are observed on dome and pyramid QDs, respectively, similar to the results reported in our previous papers [ 31 , 32 ]. For simplicity, only the dome-shaped QDs will be concerned afterwards, as the result is similar for pyramid-shaped QDs.…”
Section: Resultssupporting
confidence: 89%
“…The ring-shaped current distribution was interpreted in our previous paper [9]. The main point is that the ring-shaped current distribution is mainly attributed to the high Si-alloyed GeSi composition uniformly distributed in QDs and also the topographic shape effect.…”
Section: Resultsmentioning
confidence: 71%
“…offers an effective way to study the conductive properties of individual QDs [6][7][8], which have already been employed on various QDs, including GeSi [9,10], GaN [11,12], InP [13], TiSi 2 [14], and so on.…”
Section: Introductionmentioning
confidence: 99%
“…17 18 The composition distribution can be further supported by the selective etching experiment, as reported previously. 19 The islands were etched by using 30% H 2 O 2 for 30 min at the room temperature, and we found that both the average height and diameter of islands were reduced marginally after etching. This suggests that the most part of the islands contains Si higher than 35% and this high Si concentration is definitely due to Si atoms incorporated into Ge islands during growth at 640 C.…”
Section: Resultsmentioning
confidence: 75%