1998
DOI: 10.1557/proc-507-279
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Photo and Electroluminescence of a-Si:Er:H

Abstract: Trivalent erbium (Er3+) presents a characteristic intra 4f optical transition 4I13/2 → 4I15/2 at 1.54 μm when incorporated in several solid hosts. Hydrogenated amorphous silicon (a-Si:H) is a good candidate as a host for applications in optical communications and photonic integration. We have studied Er3+ photo and electroluminescence in a-Si:H prepared by co-sputtering from a silicon target partially covered with metallic erbium chunks. Since the presence of oxygen impurities enhances the luminescence intensi… Show more

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Cited by 7 publications
(1 citation statement)
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“…At present, the formation of luminescent nanophase Si , and rare earth incorporation into single-crystal Si are being extensively studied as potential solutions to this dilemma. For the latter approach, the rare earth ion erbium is of particular interest because its 4 I 13/2 → 4 I 15/2 luminescent transition at 1.54 μm lies at a transmission maximum for silica-based waveguides. Such studies have mainly involved erbium implanted into bulk Si 8 or porous Si, the co-deposition of erbium and silicon thin films, both crystalline or amorphous spin-on films, or erbium deposited into Si nanocrystal-rich SiO 2 . Recently, a process utilizing the kinetic trapping of erbium ions during the nucleation and growth of silicon nanoparticles in the gas phase has been developed in our laboratories .…”
mentioning
confidence: 99%
“…At present, the formation of luminescent nanophase Si , and rare earth incorporation into single-crystal Si are being extensively studied as potential solutions to this dilemma. For the latter approach, the rare earth ion erbium is of particular interest because its 4 I 13/2 → 4 I 15/2 luminescent transition at 1.54 μm lies at a transmission maximum for silica-based waveguides. Such studies have mainly involved erbium implanted into bulk Si 8 or porous Si, the co-deposition of erbium and silicon thin films, both crystalline or amorphous spin-on films, or erbium deposited into Si nanocrystal-rich SiO 2 . Recently, a process utilizing the kinetic trapping of erbium ions during the nucleation and growth of silicon nanoparticles in the gas phase has been developed in our laboratories .…”
mentioning
confidence: 99%