2004
DOI: 10.1016/j.apsusc.2003.12.005
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Photoluminescence of Er-doped hydrogenated amorphous silicon nitride

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Cited by 3 publications
(2 citation statements)
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“…6 However, some works have also demonstrated that indirect excitation of Er 3+ ions could occur via electronic states localized in the SiN x band tail states. 7,8 In this letter, we study the Er-related PL at 1.54 m in Er-doped silicon nitride thin films prepared by an ion-beamassisted evaporation technique. The evolutions of the structure and of the PL properties with the annealing treatments are studied.…”
mentioning
confidence: 99%
“…6 However, some works have also demonstrated that indirect excitation of Er 3+ ions could occur via electronic states localized in the SiN x band tail states. 7,8 In this letter, we study the Er-related PL at 1.54 m in Er-doped silicon nitride thin films prepared by an ion-beamassisted evaporation technique. The evolutions of the structure and of the PL properties with the annealing treatments are studied.…”
mentioning
confidence: 99%
“…O Er 3+ em silício amorfo hidrogenado (a-Si:H<Er>) foi considerado como ponto de partida para o estudo de nosso material. Para o a-Si:H<Er>, por ter grande potencialidade na sua aplicação no campo das telecomunicações, 28,29 existem abundantes estudos de otimização de PL, [30][31][32][33][34] desenvolvimento de dispositivos opto-eletrônicos [35][36][37][38][39] e modelos que tentam explicar os mecanismos de excitação [40][41][42][43][44][45][46][47][48] ; no entanto, estes últimos continuam sendo alvo de certa controvérsia. Estes resultados e modelos propostos para o a-Si:H<Er> foram utilizados também como guia para entender e explicar os resultados encontrados para o a-SiN x :H<Nd>.…”
Section: Energia [Ev]unclassified