2005
DOI: 10.1149/1.2032387
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Photoassisted Control of Pt Electrodeposition on p-Type Si

Abstract: A new method to control the size and distribution of electrodeposited metal on a semiconductor was investigated, using a system of Pt deposition on p-type Si. Pt is a noble metal, and electrodeposition is possible on p-type Si through hole injection to the valence band. When the Si surface is illuminated, an additional charge-transfer path becomes possible utilizing electrons photoexcited to the conduction band. The two pathways give different morphologies for the deposits. Fine and dispersed particles were el… Show more

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Cited by 31 publications
(19 citation statements)
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“…The applied potential of −0.7 V versus Ag/AgCl (3 m NaCl) is sufficiently negative to overcompensate the provided potential of the n + /p junction under illumination (Figure S9, Supporting Information) and thus deposition occurred on both top n + ‐Si and bottom p‐Si segments simultaneously (Figure S10, Supporting Information). The particles deposited under illumination were much finer than in the dark, which is in agreement with literature . Two deposition boundaries were observed, at 2.3 and 3.4 μm from the top, with an unmodified band of 1.1 μm in between (Figure S10, Supporting Information).…”
supporting
confidence: 88%
“…The applied potential of −0.7 V versus Ag/AgCl (3 m NaCl) is sufficiently negative to overcompensate the provided potential of the n + /p junction under illumination (Figure S9, Supporting Information) and thus deposition occurred on both top n + ‐Si and bottom p‐Si segments simultaneously (Figure S10, Supporting Information). The particles deposited under illumination were much finer than in the dark, which is in agreement with literature . Two deposition boundaries were observed, at 2.3 and 3.4 μm from the top, with an unmodified band of 1.1 μm in between (Figure S10, Supporting Information).…”
supporting
confidence: 88%
“…The current increases observed in Fig. 1 around 100-150 s is characteristic of a growing step, as a consequence of the restriction in the diffusion of the catalysts precursors that originate the formation of a large number of embryos from which the structure will growth increasing its area [28][29][30]. The current peak decreases as the applied overpotential increases, and disappears completely at overpotentials of −300 mV for Pt and −400 mV for Pt/Ru alloys, as a consequence of the formation of smaller particles.…”
Section: Preparation Of Mesoporous Catalystsmentioning
confidence: 94%
“…p-Si photocathode was prepared from Si (111) substrate (boron doped, 0.1-0.3 U cm resistivity), and Pt was deposited on the Si electrode by electrochemical deposition under illumination with 0.04 M H 2 PtCl 6 $5.6H 2 O (Kojima Chemicals Co. Ltd., 98%) precursor solution. 27 To shi the onset potential of Si photocathode toward anodic direction, p-Si/n-Si junction was formed by doping with phosphorous on the surface of the p-Si substrate as Boettcher et al reported. 28 Spin on phosphorous dopant (Filmtronics, P509) solution was coated on the HF cleaned p-Si substrate by spin coating at 2000 rpm followed by baking at 150 C, and annealing at 950 C for 1 h. Aer the annealing, spin on dopant was removed by etching in buffered HF solution (Aldrich) before Pt electrodeposition.…”
Section: Methodsmentioning
confidence: 99%