Photobleaching Comparison of Poly(methylphenylsilylene) and Poly(phenylsilyne)

Abstract

Articles you may be interested inVacuum-ultraviolet spectroscopy measurement of poly(methylphenylsilylene) photosensitivity Vacuum-ultraviolet spectroscopy of poly(methylphenylsilylene) Enhanced photoluminescence in a novel photobleached dithienylbenzo[c]thiophene oligomer derivativeThe effect of dimensionality on the photobleaching characteristics of Si-based polymers with phenyl substituents was investigated by studying the change in absorption upon exposure to 248-and 337-nm excitation. Poly(methylphenylsilylene) was chosen as an archetype of the linear-chain polysilanes, and poly(phenylsilyne) was used as the comparable network polysilyne. Differences in bleaching behavior of the two types of polymers are explained in terms of Si-Si bonding and electronic interactions between the phenyl groups and the silicon frameworks. Wavelength-dependent effects include the degree of photodegradation of the phenyl rings and changes in polymer configuration due to photoscission and crosslinking. Absorption changes were accompanied by changes in the refractive index of the exposed regions of the samples. The refractive index modification was used to write embedded strip waveguides in the photosensitive thin films.

Photoprogrammable molecular hybrid materials for write-as-needed optical devices

“…It is clear that there was minimal influence of alkyl chain lengths (length < 4) on the lowest energy absorption peak (associated with the Si-Si trans-planar backbone conformation). Some modification of the absorption intensity, peaking for the methyl-containing compound (PMPS), however, is observed, consistent with prior work on this material [13][14][15]. The di-n-hexyl material (no phenyl moiety) exhibits two distinct absorption peaks (Fig.…”

“…Photosensitive, linear-chain inorganic polymers based on Si, Ge, and Sn with alkyl and aryl side groups are examined. In polysilylene-based materials, for example, the established photosensitive mechanism involves photoscissioning of the r-bond conjugated linear-chain Si-backbone photoprocessing of polysilyleneand polysilyne-based thin films has resulted in refractive index modifications of up to À0.14 (at 632.8 nm) after UV-irradiation [5][6][7]. The scissioning process disrupts the bond conjugation and results in the bleaching of the UVabsorption band arising from the r-r * transition associated with this structure and the subsequent formation of a variety of molecular products including bridging, cyclic, and oligomeric moieties [8][9][10].…”

Enhancement of Polymer Luminescence by Excitation‐Energy Transfer from Multi‐Walled Carbon Nanotubes

“…The fluorescence and phosphorescence from polymer systems are often observed to suffer from photobleaching. In this process the intensity of the luminescence decays permanently on exposure to light 19. Similarly, the fluorescence from gels in nylon 6,6 samples has been observed to decay during exposure to UV light 9.…”

Comparative study on the optical properties and stability of linear and branched polysilanes

“…PMPS was prepared via the Wurtz salt condensation method [6,7], using commercially available dichloromethylphenylsilane, which was distilled under vacuum immediately prior to use. Typical reaction conditions include the addition of neat dichloromethylphenylsilane into a 2.2-fold excess of rapidly stirred sodium sand in refluxing toluene solvent.…”