Photocatalytic activity of doped TiO2 coatings prepared by sputtering deposition

Anatase thin films by ultrasonic spray pyrolysis

“…There are many techniques to synthesis TiO 2 thin films, including sol-gel [12,13], sputtering [14][15][16], gel oxidation [17], plasma-enhanced chemical vapour deposition (PECVD) [18], anodic oxidation [19], electrophoretic deposition [20], pulsed laser deposition (PLD) [21], electron-beam evaporation [22], and spray pyrolysis [23,24]. Under certain conditions, spray pyrolysis may act as a chemical vapour deposition (CVD) process.…”

Crystallite phase-controlled preparation, characterisation and photocatalytic properties of titanium dioxide nanoparticles

“…There are many methods of producing nanostructured TiO 2 , such as the hydrothermal method [9,10], sol-gel technique [11,12], chemical vapour deposition (CVD) [13][14][15], physical vapour deposition [16,17], solvothermal method [18,19], electrochemical approaches (e.g. anodising of Ti) [20][21][22], solution combustion method [23][24][25], microemulsion [26,27], micelle and inverse micelle methods [28,29], ball milling [30], a flame by vapour phase [31], sonochemical reactions [32] and plasma evaporation [33,34].…”

The temperature dependent analysis of Au/TiO2 (rutile)/n-Si (MIS) SBDs using current–voltage–temperature (I–V–T) characteristics

“…Interfacial layers between metal and semiconductor such as TiO 2 , Si 3 N 4 and SnO 2 have been widely used due to their high dielectric constant and low density of surface states [6,10,16,[24][25][26][27][28][29][30][31]. Among these interfacial layers, the TiO 2 thin film has been widely used in many optical and electrical device applications such as optical filters, antireflection coatings and solar cells due to its large band gap, high dielectric constant and high refractive index [24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40]. There are three types of TiO 2 bulk crystal structure: anatase, rutile and brookite.…”