“…The surface modification of semiconductor photocatalysts has been done to modify the activity of the photocatalysts, to accelerate the reaction by the modification of the affinity to reactants, to enhance the photon absorption ability and prevent the fouling, to impart molecular recognition by molecular sieving effects of porous silica, and to suppress the reactivity by covering the surface to block the reactant access. − When TiO 2 is used as UV absorbing pigment in paints, chalking and color fading of paints are caused by the photocatalytic activity of TiO 2 even by the sunlight. , The formation of reactive oxygen species, which is harmful to human skin, by a UV absorber (TiO 2 ) is pointed out for the sunscreen application. − Thus, the photocatalytic activity of TiO 2 is required to be suppressed for such applications as paints and cosmetics. Heteroelement doping − and coating of TiO 2 particles with aluminum oxide, tin oxide, and silicon dioxide have been reported for suppressing the photocatalytic activity of TiO 2 particles. − To suppress the photocatalytic activity more precisely, it is important to develop efficient coating protocols for uniform and perfect coverage to completely block the particle surface from accessing of the reactants.…”