Photochemical atomic layer deposition and etching

Chalker, Paul R.

doi:10.1016/j.surfcoat.2016.02.046

Cited by 33 publications

(24 citation statements)

References 30 publications

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“…ALD assisted by UV irradiation has also been used for enhanced growth of metal oxide thin lms. [40][41][42][43][44][45][46][47] In our previous report, uniform and conformal ZrO 2 thin lms were deposited on plastic substrates at room temperature (RT) by UV-enhanced ALD (UV-ALD). 43 One can expect that high-quality Al 2 O 3 thin lms may be obtained at low deposition temperature by using UV-ALD.…”

Section: Introductionmentioning

confidence: 99%

UV-enhanced atomic layer deposition of Al₂O₃ thin films at low temperature for gas-diffusion barriers

et al. 2017

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Section: Introductionmentioning

confidence: 99%

UV-enhanced atomic layer deposition of Al₂O₃ thin films at low temperature for gas-diffusion barriers

et al. 2017

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“…Instead, the precursors react one at a time with the substrate or film surface groups in a digital manner [62,63]. ALD has different variations, including thermal ALD [64], plasma-enhanced ALD (PEALD) [65] and photo-ALD [66,67], depending on how energy is supplied to the deposition reaction. Thermal ALD refers to a process where the energy for the surface reactions is produced by heating.…”

Section: Basic Principlementioning

confidence: 99%

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

2018

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Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery components is necessary. To that end, metal fluorides could provide interesting new conversion cathode and solid electrolyte materials for future batteries. To be applicable in thin film batteries, metal fluorides should be deposited with a method providing a high level of control over uniformity and conformality on various substrate materials and geometries. Atomic layer deposition (ALD), a method widely used in microelectronics, offers unrivalled film uniformity and conformality, in conjunction with strict control of film composition. In this review, the basics of lithium-ion batteries are shortly introduced, followed by a discussion of metal fluorides as potential lithium-ion battery materials. The basics of ALD are then covered, followed by a review of some conventional lithium-ion battery materials that have been deposited by ALD. Finally, metal fluoride ALD processes reported in the literature are comprehensively reviewed. It is clear that more research on the ALD of fluorides is needed, especially transition metal fluorides, to expand the number of potential battery materials available.

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“…Atomic layer deposition (ALD) is a vapor deposition technique enabling the preparation of thin film materials with high conformality and excellent control over the thickness (Chalker, 2016;George and Steven M. George, 2010;Ritala and Leskelä, 2002). Its origins can be traced back to two different places (Puurunen, 2014).…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition for biosensing applications

Graniel

Weber

Balme

et al. 2018

Biosensors and Bioelectronics

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Atomic layer deposition (ALD) is a thin film deposition technique currently used in various nanofabrication processes for microelectronic applications. The ability to coat high aspect ratio structures with a wide range of materials, the excellent conformality, and the exquisite thickness control have made ALD an essential tool for the fabrication of many devices, including biosensors. This mini-review aims to provide a summary of the different ways ALD has been used to prepare biosensor devices. The materials that have been deposited by ALD, the use of the ALD layers prepared and the different types of biosensors fabricated are presented. A selected list of studies will be used to illustrate how the ALD route can be implemented to improve the operational performance of biosensors. This work comprehensively shows the benefits of ALD and its application in various facets of biosensing and will help in exploiting the numerous prospects of this emerging and growing field.

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Photochemical atomic layer deposition and etching

Cited by 33 publications

References 30 publications

UV-enhanced atomic layer deposition of Al₂O₃ thin films at low temperature for gas-diffusion barriers

UV-enhanced atomic layer deposition of Al₂O₃ thin films at low temperature for gas-diffusion barriers

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Atomic layer deposition for biosensing applications

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Photochemical atomic layer deposition and etching

Cited by 33 publications

References 30 publications

UV-enhanced atomic layer deposition of Al2O3 thin films at low temperature for gas-diffusion barriers

UV-enhanced atomic layer deposition of Al2O3 thin films at low temperature for gas-diffusion barriers

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Atomic layer deposition for biosensing applications

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Product

Resources

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UV-enhanced atomic layer deposition of Al₂O₃ thin films at low temperature for gas-diffusion barriers

UV-enhanced atomic layer deposition of Al₂O₃ thin films at low temperature for gas-diffusion barriers