Photochemical Etching of Carbonyl Groups from a Carbon Matrix: The (001) Diamond Surface

Weston, Leigh; Downes, James E.; Baldwin, C. G.; Tawfik, Sherif Abdulkader; Cui, Xiangyuan; Stampfl, Catherine; Mildren, Richard P.

doi:10.1103/physrevlett.122.016802

Cited by 9 publications

(2 citation statements)

References 21 publications

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“…This method is currently investigated in the frame of quantum theory, and the calculation shows that the desorption probability would saturate within hundreds of femtoseconds after excitation and has a superlinear dependence on the lifetime of excited states [80]. Experimental investigation has also been conducted on diamond (001) surface terminated by oxygen atoms [81]. After 4 min exposure to 266 nm, 5 ns laser with the fluence of 10 mJ cm −2 , material removal depth about only one lattice constant (0.357 nm) is achieved.…”

Section: Atomic Layer Removal and Surface Atom Ejectionmentioning

confidence: 99%

“…Keeping the total pulse energy constant, the enhancement reaches a maximum when two color components are roughly equally mixed. For the CALID process of Oterminated diamond, TDDFT reveals that carbon atom emission is realized via the excitation of surface carbonyl into a triply bonded CO like state, accompanied by the scission of C-C backbond [81]. Large laser intensity and short wavelength facilitate the desorption of Cl-adsorbed Si atoms on the top layer, on which the force would oscillate rapidly then become repulsive about several nano-newtons [124].…”

Section: Simulation Approachesmentioning

confidence: 99%

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Laser machining fundamentals: micro, nano, atomic and close-to-atomic scales

Wang

et al. 2023

Int. J. Extrem. Manuf.

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With the rapid development in advanced industries, such as microelectronics and optics sectors, the functional feature size of devises/components has been decreasing from micro to nanometric, and even atomic and close-to-atomic scale (ACS) for higher performance, smaller volume and lower energy consumption. By this time, a great many quantum structures are proposed, with not only an extreme scale of several or even single atom, but also a nearly ideal lattice structure with no material defect. It is almost no doubt that such structures play critical role in the next generation products, which shows an urgent demand for the atomic and close-to-atomic scale manufacturing (ACSM). Laser machining is one of the most important approaches widely used in engineering and scientific research. It is high-efficient and applicable for most kinds of materials. Moreover, the processing scale covers a huge range from millimeters to nanometers, and has already touches the atomic level. Laser-material interaction mechanism, as the foundation of laser machining, determines the machining accuracy and surface quality. It becomes much more sophisticated and dominant with a decrease in processing scale, which is systematically reviewed in this article. In general, the mechanisms of laser-induced material removal are classified into ablation, Coulomb explosion and atomic desorption, with a decrease in the scale from above microns to angstroms. The effects of processing parameters on both fundamental material response and machined surface quality are discussed, as well as theoretical methods to simulate and understand the underlying mechanisms. Examples at nanometric to atomic scale are provided, which demonstrate the capability of laser machining in achieving the ultimate precision and becoming a promising approach to ACSM.

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Section: Atomic Layer Removal and Surface Atom Ejectionmentioning

confidence: 99%

Section: Simulation Approachesmentioning

confidence: 99%