Direct
optical lithography of functional inorganic nanomaterials
(DOLFIN) is a photoresist-free method for high-resolution patterning
of inorganic nanocrystals (NCs) that has been demonstrated using deep
UV (DUV, 254 nm) photons. Here, we expand the versatility of DOLFIN
by designing a series of photochemically active NC surface ligands
for direct patterning using various photon energies including DUV,
near-UV (i-line, 365 nm), blue (h-line, 405 nm), and visible (450
nm) light. We show that the exposure dose for DOLFIN can be ∼30
mJ/cm2, which is small compared to most commercial photopolymer
resists. Patterned nanomaterials can serve as highly robust optical
diffraction gratings. We also introduce a general approach for resist-free
direct electron-beam lithography of functional inorganic nanomaterials
(DELFIN) which enables all-inorganic NC patterns with feature size
down to 30 nm, while preserving the optical and electronic properties
of patterned NCs. The designed ligand chemistries and patterning techniques
offer a versatile platform for nano- and micron-scale additive manufacturing,
complementing the existing toolbox for device fabrication.