1999
DOI: 10.1016/s0032-3861(98)00460-1
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Photocrosslinked polymers based on pendant extended chalcone as photoreactive moieties

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Cited by 92 publications
(57 citation statements)
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“…The poly(DCP-co-HEA) and poly(DCP-co-S) (Fig. 2) were prepared in EMK by a free radical polymerization technique and were characterized by FT-IR, 1 HNMR and UV-Vis to confirm the structure. The FT-IR spectrum of the DHP, DCP and poly(DCP) is shown in the Fig.…”
Section: Resultsmentioning
confidence: 99%
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“…The poly(DCP-co-HEA) and poly(DCP-co-S) (Fig. 2) were prepared in EMK by a free radical polymerization technique and were characterized by FT-IR, 1 HNMR and UV-Vis to confirm the structure. The FT-IR spectrum of the DHP, DCP and poly(DCP) is shown in the Fig.…”
Section: Resultsmentioning
confidence: 99%
“…ALPHA BRUKER FT-IR spectrophotometer was used for recording IR spectrum and the spectra were recorded using KBr pellet method. 1 H NMR spectra of the samples were run on a Bruker FT-NMR spectrophotometer operating at 500 MHz using CDCl 3 or DMSO-d 6 as a solvent and tetramethyl silane (TMS) as an internal reference. UV absorption measurements were recorded using LABINDIA model UV 320 instrument by dissolving polymer samples in tetrahydrofuran (THF).…”
Section: Methodsmentioning
confidence: 99%
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“…The problem with the absorption spectral band at 1601 cm À1 is that it is normally superposed with the absorption bands of the double bonds in the benzene ring, but the benzene ring is not effected by UV light and the other two absorptions of the double bonds in the ring are not changed, thus any change in the absorption at 1601 cm À1 is due to a breaking of the double bond in chalcone. 13,16,24 By monitoring the behaviour of the 1601 cm À1 absorption the extent of photocrosslinking can be investigated but trans-cis isomerization can not be followed.…”
Section: Comparison Of Uv-vis and Infrared Spectroscopic Studymentioning
confidence: 99%
“…Polymers with photofunctional groups like the photopolymer containing 1,3-bis(4-hydroxyphenyl)-propenene, 12 poly(4-[5-(4-hydroxyphenyl)-3-oxopenta-1,4-dienyl]-phenyl-2-methacrylate), 13 polymers with bis(benzylidene)cyclohexanone units, 14 poly(dimethylmaleimide methacrylate), 15 poly(nonbornene derivative)s, 16 poly[(2 -4-bromobenzoyl)-4-styryloxyhexylmethacrylate], 17 poly(propylene fumarate), 18 methacrylate polymers comprising 2-cinnamoyloxyethoxybiphenyl side groups, 19 poly[(4-ethylphenoxy)-(phenoxy)phosphazene], 20 2-(dimethylmaleimido)-N-et-hylacrylamide, 21 poly(4-trimethylsilylmethyl styrene) thin films, 22 photosensitive poly(amic acid)s, 23 photochromic spiroxazine polymers containing a chalcone moiety, 24 poly(acryloyloxy styryl phenyl ketone) 25 and poly(2-trimethylsilyl-2-propyl methacrylate) 26 are some of the photoresists reported in the literature.…”
mentioning
confidence: 99%