1992
DOI: 10.1021/ma00028a030
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Photodegradation and electron-beam-induced degradation of poly[(pentamethyldisilyl)styrene sulfones]

Abstract: Photodegradation and electron-beam-induced degradation of poly[(pentamethyldisilyl)styrene sulfonels were investigated by flash and pulse radiolysis techniques. The transient absorption spectra obtained by the flash photolysis for the solution of nonaltemating poly [(pentamethyldisilyl)styrene sulfonels in THF (tetrahydrofuran) showed the formation of benzyl radical as a transient intermediate. On the other hand, the transient absorption spectra for an alternating poly [(pentamethyldisilyl)styrene sulfone] did… Show more

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Cited by 8 publications
(5 citation statements)
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“…Two sets of peaks can be recognized (left inset in Figure 7), which can be ascribed to structures (S A to S D ) compatible with alkylene sulfone depolymerization because they feature terminal double bonds and sulfinic acids. This is not a surprising phenomenon because aliphatic polysulfones [poly(alkenyl sulfones)] are well known to depolymerize under mild conditions: the weak C—S bond can be easily cleaved thermally44 or via irradiation (e.g., X‐rays45, 46 or electron beams47), releasing ultimately SO 2 and olefins. It is unclear whether the observed reduction in molecular weight can be ascribed to depolymerization occurring during oxidation, or to a fragmentation during MALDI‐TOF analysis.…”
Section: Resultsmentioning
confidence: 99%
“…Two sets of peaks can be recognized (left inset in Figure 7), which can be ascribed to structures (S A to S D ) compatible with alkylene sulfone depolymerization because they feature terminal double bonds and sulfinic acids. This is not a surprising phenomenon because aliphatic polysulfones [poly(alkenyl sulfones)] are well known to depolymerize under mild conditions: the weak C—S bond can be easily cleaved thermally44 or via irradiation (e.g., X‐rays45, 46 or electron beams47), releasing ultimately SO 2 and olefins. It is unclear whether the observed reduction in molecular weight can be ascribed to depolymerization occurring during oxidation, or to a fragmentation during MALDI‐TOF analysis.…”
Section: Resultsmentioning
confidence: 99%
“…The unzipping degradation of a polymer main chain containing heteroatoms by X-ray or electron-beam irradiation has been achieved. For a poly(1-butene sulfone), only partial depolymerization occurs, and olefins are present in the gas produced by the irradiation [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…It has been known that in the case of a poly-(1-butene sulfone), a partial depolymerization occurs, and olefins are involved in the gas produced by γ-rays or electron-beam irradiation. 11,12 A poly(olefin sulfone) possesses sulfonyl groups (-SO 2 -) in the main chain, and they are easily synthesized by radical polymerization of an olefin monomer in a liquefied sulfur dioxide. 13,14 The olefin radical is unstable; however, the sulfonyl radical is fairly stable.…”
Section: Introductionmentioning
confidence: 99%
“…However, most depolymerizable polymers known so far require γ-rays or electron beam irradiation for the depolymerization process. , There are only a few that are known to exhibit depolymerization by low-energy irradiation. The unzipping degradation of a polymer main chain by irradiation was achieved in polymers containing heteroatoms in a main chain. It has been known that in the case of a poly(1-butene sulfone), a partial depolymerization occurs, and olefins are involved in the gas produced by γ-rays or electron-beam irradiation. , A poly(olefin sulfone) possesses sulfonyl groups (−SO 2 −) in the main chain, and they are easily synthesized by radical polymerization of an olefin monomer in a liquefied sulfur dioxide. , The olefin radical is unstable; however, the sulfonyl radical is fairly stable. The olefin radical generated in liquefied sulfur dioxide immediately reacts with a sulfur dioxide molecule and results in an alkylated sulfonyl radical.…”
Section: Introductionmentioning
confidence: 99%