2019
DOI: 10.1109/jphot.2019.2910130
|View full text |Cite
|
Sign up to set email alerts
|

Photoelectric Dual Control Negative Differential Resistance Device Fabricated by Standard CMOS Process

Abstract: To prepare a desired negative differential resistance (NDR) device by standard complementary-metal-oxide-semiconductor (CMOS) process, a photoelectric dual control NDR device with a PNP bipolar-junction-transistor (BJT) and an NPN BJT was designed and fabricated by using the Si-base standard 0.18 μm CMOS process without any process modification and a special substrate. In order to reduce the valley current under optical control, a metal mask was added to the NDR device. The results show that the device exhibit… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

2019
2019
2022
2022

Publication Types

Select...
4
2

Relationship

2
4

Authors

Journals

citations
Cited by 6 publications
(3 citation statements)
references
References 24 publications
0
3
0
Order By: Relevance
“…A neuron transistor is a high-function multi-input logic device [31] that can be used to realize the same functions as neuron cells. The original neuron transistor was fabricated using a double-poly silicon CMOS process [12][13][14], but it can be implemented using the NDR devices which are realized using the 180-nm UMC CMOS [32,33] process as well.…”
Section: Neuron Transistormentioning
confidence: 99%
“…A neuron transistor is a high-function multi-input logic device [31] that can be used to realize the same functions as neuron cells. The original neuron transistor was fabricated using a double-poly silicon CMOS process [12][13][14], but it can be implemented using the NDR devices which are realized using the 180-nm UMC CMOS [32,33] process as well.…”
Section: Neuron Transistormentioning
confidence: 99%
“…The UMC 0.18 µm CMOS process provides six metal layers with intermediate dielectric layers (SiO 2 ) between them. The CMOS process can be used to design not only digital and analog circuits, but also optoelectronic devices [22][23][24]. The major advantage is that signals detected by the detector can be amplified and processed on the chip.…”
Section: On-chip Thz Antennamentioning
confidence: 99%
“…A RTD is a semiconductor that exhibits controllable negative difference resistance (NDR) regions. The N-shaped I-V characteristics [27,28] of RTDs provide electrical gain for THz oscillator at room temperature [14]. A RTD is realized via the creation of a double-barrier quantum well (DBQW) structure [26] comprising a narrow-bandgap material sandwiched between two thin slabs of a wide-bandgap material.…”
Section: Modelingmentioning
confidence: 99%