1987
DOI: 10.1049/el:19870470
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Photoelectrochemical laser interference etching for fabrication of 235 nm diffraction gratings on n -InP

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Cited by 8 publications
(3 citation statements)
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“…The first inequality (8) means that gain is small over distances of the order of a wavelength )Jn0 in optical medium, A = 2rc/w being the wavelength of light in vacuum. The second and third inequalities (8) imply that the perturbations of the refractive index and gain constant are small.…”
Section: Introductionmentioning
confidence: 99%
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“…The first inequality (8) means that gain is small over distances of the order of a wavelength )Jn0 in optical medium, A = 2rc/w being the wavelength of light in vacuum. The second and third inequalities (8) imply that the perturbations of the refractive index and gain constant are small.…”
Section: Introductionmentioning
confidence: 99%
“…The second and third inequalities (8) imply that the perturbations of the refractive index and gain constant are small. The inequalities (8) allow us to write the electric permittivity (z) (6) of optical laser medium as E(z) n + i2nm0 + 2n [n (z) + im1(z)] cos(gz + çô) .…”
Section: Introductionmentioning
confidence: 99%
“…The grating can be fabricated either by using a holographic technique based on laser beam interference [2], [3] or by using electron beam lithography (EBL) [4]. EBL has many advantages compared to holographic methods.…”
Section: Introductionmentioning
confidence: 99%