1989
DOI: 10.1149/1.2096523
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Photoelectrochemically‐Induced Gold Deposition on p ‐ GaAs Electrodes: Part I . Nucleation and Growth

Abstract: This paper reports on the deposition of Au on cathodically biased p-GaAs electrodes from alkaline KAu(CN)2 solutions in the dark or under illumination. Nucleation and growth of Au have been studied by potentiodynamic and potentiostatic current measurements in combination with scanning and transmission electron microscopy. Au deposition is characterized by progressive nucleation and three-dimensional growth followed by coalescence of Au particles. Different mechanisms of electron transfer processes occurring du… Show more

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Cited by 21 publications
(16 citation statements)
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“…As our specimens are lowdoped, we assume that electrodeposition of Au occurs only when the negative potential V D is applied. 16 This allows the calculation of the charge, needed to deposit layers of a certain average thickness, by means of the Faraday equation, assuming that all the charge is used for the reduction of the gold(I)-ions. Layers with thicknesses varying between 15 nm and 300 nm were deposited on both crystal faces with the deposition potential V D ranging within the same potential window as in the chronoamperometry measurements.…”
mentioning
confidence: 99%
“…As our specimens are lowdoped, we assume that electrodeposition of Au occurs only when the negative potential V D is applied. 16 This allows the calculation of the charge, needed to deposit layers of a certain average thickness, by means of the Faraday equation, assuming that all the charge is used for the reduction of the gold(I)-ions. Layers with thicknesses varying between 15 nm and 300 nm were deposited on both crystal faces with the deposition potential V D ranging within the same potential window as in the chronoamperometry measurements.…”
mentioning
confidence: 99%
“…V D ranged within the potential window where deposition transients were observed, without the interference of H 2 (g)-evolution. From earlier work [2,3,7], it was concluded that electrodeposition of Au on n-GaAs is, under the conditions (N D and electrolyte solution) of this work, a conduction band process. So, deposition occurs only when the negative potential V D is applied.…”
Section: Resultsmentioning
confidence: 71%
“…In the first one, an approximately 600 nm thick Au contact layer was obtained using potassium dicyanoaurate, K[Au(CN) 2 ], and a water solution as an electrolyte under 350–375 µA/cm 2 current density. K[Au(CN) 2 ] solution was utilized for the deposition of Au on p - and n -type GaAs nearly three decades ago [ 41 , 42 , 43 ]. The same protocol was used in our previous work on binary arsenide, namely InAs [ 34 ], proving that these contacts adhere well to arsenide epilayers.…”
Section: Resultsmentioning
confidence: 99%
“…The same protocol was used in our previous work on binary arsenide, namely InAs [34], proving that these contacts adhere well to arsenide epilayers. Regarding Au electrodeposition on A III -As, there have been only a few reports, not necessarily on InAsSb but rather on GaAs [41][42][43]. A study on the electrochemical behavior of distinct GaAs surfaces in an Au-containing aqueous electrolyte solution revealed that the nucleation mechanism of Au on these surfaces depends on the chemical composition of the surface [22,44].…”
Section: Metallization Approachesmentioning
confidence: 99%