2000
DOI: 10.1116/1.582213
|View full text |Cite
|
Sign up to set email alerts
|

Photoinduced dichroism and its low-temperature characteristics in obliquely deposited amorphous As–Ge–Se–S thin films

Abstract: The photoinduced dichroism and its low-temperature characteristics in obliquely deposited amorphous As–Ge–Se–S thin films have been studied using a linearly polarized 632.8 nm He–Ne laser light and a control system capable of increasing the film temperature from 77 K. Our experimental results have been discussed on the basis of native valence-alternation pairs depended on the film fabrication. Although the absorption slopes in the extended region (hν>Eop) decrease with increasing deposition angle, the o… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2001
2001
2024
2024

Publication Types

Select...
5
1

Relationship

2
4

Authors

Journals

citations
Cited by 20 publications
(1 citation statement)
references
References 22 publications
0
1
0
Order By: Relevance
“…4) The structural changes in achalcogenides have been explained on the basis of behaviors of intrinsically charged defects, called valence-alternation pairs (VAPs). [5][6][7][8][9] VAPs either originate from the neutral defects on the process of film deposition via an exothermic reaction with an overall negative effective correlation energy (native VAPs) or are created from regular atoms by illumination of over-band-gap light (photo-created VAPs).…”
Section: Introductionmentioning
confidence: 99%
“…4) The structural changes in achalcogenides have been explained on the basis of behaviors of intrinsically charged defects, called valence-alternation pairs (VAPs). [5][6][7][8][9] VAPs either originate from the neutral defects on the process of film deposition via an exothermic reaction with an overall negative effective correlation energy (native VAPs) or are created from regular atoms by illumination of over-band-gap light (photo-created VAPs).…”
Section: Introductionmentioning
confidence: 99%