Photolithographic Patterning of Perovskite Thin Films for Multicolor Display Applications

Abstract

Metal halide perovskites are emerging as attractive materials for light-emitting diode (LED) applications. The external quantum efficiency (EQE) has experienced a rapid progress and reached over 21%, comparable to the state of the art organic and quantum dot LEDs. For metal halide perovskites, their simple solution-processing preparation, facile band gap tunability, and narrow emission line width provide another attractive route to harness their superior optoelectronic properties for multicolor display applications. In this work, we demonstrate a high-resolution, large-scale photolithographic method to pattern multicolor perovskite films. This approach is based on a dry lift-off process which involves the use of parylene as an intermediary and the easy mechanical peeling-off of parylene films on various substrates. Using this approach, we successfully fabricated multicolor patterns with red and green perovskite pixels on a single substrate, which could be further applied in liquid crystal displays (LCDs) with blue backlight. Besides, a prototype green perovskite micro-LED display under current driving has been demonstrated.

In Situ Inkjet Printing Patterned Lead Halide Perovskite Quantum Dot Color Conversion Films by Using Cheap and Eco‐Friendly Aqueous Inks

“…fabricated multicolor patterns with red and green perovskite pixels on a single substrate by a photolithography method, and demonstrated a prototype of a green perovskite micro‐LED display based on PQD CCFs. [ 18 ] However, there are still many challenges in the manufacturing method, optical properties, resolution, uniformity, and stability of PQD‐based CCFs. [ 19 ]…”

Electron-Beam Irradiation Induced Regulation of Surface Defects in Lead Halide Perovskite Thin Films

“…The exposure doses for sites A, B, and C are 8800 μ C/cm 2 (equivalent to MAPI 6-4 ), 4050 μ C/cm 2 (equivalent to MAPI 7-2 ), and 0 (equivalent to MAPI 0 ), respectively, and their PL emission spectra are shown in Figure 5(c) with an optical image inset. This patterning method has potential applications in fabricating perovskite-based micro-LED display, which is widely believed to be incompatible with typical top-down lithography [ 59 ].…”

Metal Halide Perovskite Arrays: From Construction to Optoelectronic Applications

“…To address the incompatibility between perovskites and solvents, Zou et al developed a dry lift-off approach based on the poor adhesion between parylene-C film and substrate for patterning perovskite arrays photolithographically in micrometer resolution. [53] A desired pattern was formed on the parylene-C film through the standard photolithography and reactive ion etching (RIE) process, followed by perovskite precursor spin-coating and crystallization. Then, the parylene-C film was easily peeled off, leaving the perovskite film array on the substrate (Figure 5i).…”