1993
DOI: 10.1063/1.352952
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Photoluminescence assessment of B, P, and Al in Si wafers: The problem of sample heating by a laser beam

Abstract: A line shape analysis of free-exciton low-temperature (4.2 K) photoluminescence spectra is applied to monitor the heating of Si samples due to an exciting Arf-ion laser beam. The heating is studied in dependence on the laser beam intensity. The temperature as a line shape fitting parameter can be established within ho.15 K. Continuous minor increase of the sample temperature is observed up to an intensity of-200 W cmm2, followed by an abrupt temperature jump up to tens of K. Possible inaccuracies, resulting fr… Show more

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Cited by 14 publications
(18 citation statements)
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“…However, measurement under the high excitation power had a serious error in determining the BE and FE line intensities [6] caused primarily by the rise of the sample temperature. Therefore, we improved the technique by controlling the sample temperature.…”
Section: Introductionmentioning
confidence: 99%
“…However, measurement under the high excitation power had a serious error in determining the BE and FE line intensities [6] caused primarily by the rise of the sample temperature. Therefore, we improved the technique by controlling the sample temperature.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, a suitable method for the determination of the sample temperature has to be applied. We found this in Pelant et al [ 16 ] This is because stable measurement conditions and evaluation methods are of crucial importance, especially for the question of whether activation of the B Si –Si i defect leads to a reduction in the B TO (BE)/I TO (FE) intensity ratio. [ 10 ]…”
Section: Methodsmentioning
confidence: 59%
“…The sample temperature and the B TO (BE) peak height were determined according to Pelant et al [ 16 ] in this work. Figure is presented to give a short overview of our spectra evaluation method.…”
Section: Methodsmentioning
confidence: 99%
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“…In this work, the spectra measured on samples with different doping concentrations were modelled based on a PL curve that was measured on a lightly doped silicon wafer ( N A < 1 × 10 15 cm −3 ) which has minimum influence from the dopants at liquid nitrogen temperature . Note that no model was applied to the mentioned PL spectra although in principle it can be modelled with the Maxwell‐Boltzmann distribution . The normalised PL spectrum for this lightly doped sample is provided in a supplementary file, refer to Supporting Information for details.…”
Section: Resultsmentioning
confidence: 99%