2015
DOI: 10.1002/pssr.201510315
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Photoluminescence enhancement by localized surface plasmons in AlGaN/GaN/AlGaN double heterostructures

Abstract: Double heterostructures AlGaN/GaN/AlGaN grown by hydride vapor phase epitaxy and designed for use as light emitting diodes for 360 nm wavelength were patterned by shallow nanoholes and injected with Ag/SiO2 or Al nanoparticles. A 1.8 times increase in the photoluminescence and microcathodoluminescence signal from the GaN active region was observed for 100 nm diameter Al nanoparticles, the efficiency decreased compared to the reference planar samples for small Al nanoparticles of 30–40 nm diameter, and a modera… Show more

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Cited by 7 publications
(4 citation statements)
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“…Once an optimal parameter range for both optical and electric functionality has been found, the feasibility of fabrication should be addressed. Production scale techniques for nanostructured p-contact, such as those www.nature.com/scientificreports/ presented here, are readily available, i.e., nanosphere lithography 44,45 , nano-imprint technology 46 , displacement Talbot lithography 47 , and laser interferometry 22 . Using these techniques, nano-patterns with lateral sizes down to 100 nm can eventually be fabricated.…”
Section: Resultsmentioning
confidence: 99%
“…Once an optimal parameter range for both optical and electric functionality has been found, the feasibility of fabrication should be addressed. Production scale techniques for nanostructured p-contact, such as those www.nature.com/scientificreports/ presented here, are readily available, i.e., nanosphere lithography 44,45 , nano-imprint technology 46 , displacement Talbot lithography 47 , and laser interferometry 22 . Using these techniques, nano-patterns with lateral sizes down to 100 nm can eventually be fabricated.…”
Section: Resultsmentioning
confidence: 99%
“…The thickness of the film was 1.6 μm. Besides, some measurements were carried out on the AlGaN-based UV LED heterostructure with thin (150 nm) p-Al x Ga 1−x N top layer discussed elsewhere, 14 in which x is close to 0.1. The Mg concentration was close to 5 × 10 19 cm −3 in both cases.…”
Section: Methodsmentioning
confidence: 99%
“…Gallium nitride (GaN) based semiconductor materials have attracted extensive attention due to their enormous potential for use in the field of microelectronic . Due to the lack of low‐cost free standing substrate, GaN material based on the heteroepitaxy technique suffers from high density of threading dislocations (TDs), which is caused by the large differences in relevant lattice constant and thermal expansion coefficient between the foreign substrates and GaN epitaxial film.…”
mentioning
confidence: 99%