We have studied the 77 K photoluminescence ͑PL͒ of undoped-Al x Ga 1Ϫx As (0.21рxр0.83) grown by organometallic vapor phase epitaxy. A deep broad ͑DB͒ PL band is found at 1.6-1.7 eV at a range of x from 0.21 to 0.63, with a maximum intensity at around xϭ0.5. Its large full width at half-maximum (ϳ200 meV) suggests that this emission originates from some impurity-defect complex. The Si-and C-doping dependencies of the PL reveal that the emission disappears in Si-doped n-type samples while it increases in intensity superlinearly with the hole concentration, thus, the emission center is C acceptor related. Furthermore, annealing Al 0.52 Ga 0.48 As samples in H 2 flow eliminates the emission, while annealing in AsH 3 flow increases the emission. Based on these results, we have considered the doping and V/III dependencies of various major point defects present in p-type GaAs and those of the combinations of the C acceptor and these defects. It is concluded that the DB band originates from the substitutional C-As antisite complex (C As -As Ga ). Mass-action rule analysis of the complex deduces a quadratic increase in the PL intensity with hole concentration, which generally explains the experimental results. © 1997 American Institute of Physics. ͓S0021-8979͑97͒06211-7͔