Recombination characteristics of n-Al x Ga 1Ϫx As/n-In 0.5 Ga 0.5 P type-II band line-up heterostructures are investigated using time-integrated and time-resolved photoluminescence ͑PL͒ measurements. It is observed that the decay time of the Al x Ga 1Ϫx As luminescence depends on whether or not the excitation photon energy, ប e , is larger than the In 0.5 Ga 0.5 P band-gap energy, E g,InGaP . If ប e ϾE g,InGaP , photoexcited holes in the Al x Ga 1Ϫx As and In 0.5 Ga 0.5 P layers are found to be in equilibrium within about 0.4 ns. The interface-related below-band-gap ͑BBG͒ PL shows a large blueshift as the excitation intensity is increased. The extremely long decay time of the BBG PL is attributed to the somewhat smaller wave function overlap between spatially separated, two-dimensional electrons and holes due mainly to the nonabrupt interfacial nature of the employed samples. The fast transient behavior of the BBG luminescence under high excitation intensity, as well as the peak energy blueshift, are explained by the band filling effect.